X-Rays and Extreme Ultraviolet Radiation


Book Description

Master the physics and understand the current applications of modern X-ray and EUV sources with this fully updated second edition.










EUV Sources for Lithography


Book Description

This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.




Time-resolved Diffraction


Book Description

Recent technological advances in synchrotron and neutron sources, detectors, and computer hardware and software have made possible diffraction techniques which collect data at successive moments in time. This is the first book to bring together reviews and research articles covering the three branches of time-resolved diffraction--X-ray, electron, and neutron field. Time-Resolved Diffraction covers gases, liquids, amorphous solids, fibers, and crystals and does so in a multidisciplinary framework which includes examples from molecular biology and chemistry, as well as techniques from physics and materials science. The various time scales of data collection cover ten orders of magnitude, from the sub-pico domain to the kilosecond. Research scientists and graduate students will find this book the most complete compendium of work in this developing field.




Logos


Book Description




Soft X-Rays and Extreme Ultraviolet Radiation


Book Description

This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.




Applications


Book Description

Nanospectroscopy addresses the spectroscopy of very small objects down to single molecules or atoms, or high-resolution spectroscopy performed on regions much smaller than the wavelength of light, revealing their local optical, electronic and chemical properties. This work highlights modern examples where optical nanospectroscopy is exploited in modern photonics, optical sensing, the life sciences, medicine, or state-of-the-art applications in material, chemical and biological sciences. Two-volume graduate textbook "Optical Nanospectroscopy" by the editors: Vol. 1: Fundamentals & Methods. Vol. 2: Instrumentation, Simulation & Materials.







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