Electroabsorption Mechanisms in Germanium Quantum Well Material


Book Description

One possible solution to make viable optoelectronic modulators that meet strict targets down to the scale of on-chip communication is to use germanium-rich materials. Ge/SiGe quantum wells grown on silicon substrates provide the strongest mechanism, the quantum-confined Stark effect (QCSE), and thereby can meet the strictest requirements for optical interconnects, including CMOS-compatibility. Using such a strong effect, Ge-based modulators can be ultra-compact, ultralow-power, large bandwidth and high-speed, making them a strong contender for the future of optoelectronic device integration to solve the bottleneck problem. In this thesis, we will discuss the physical properties of the Ge and SiGe material system then present designs of optoelectronic modulators at the important 1310 nm and 1550 nm communication wavelengths using a program we developed called the Simple Quantum Well Electroabsorption Calculator (SQWEAC). SQWEAC takes the important physical mechanisms present, such as QCSE and indirect absorption, to predict the electroabsorption profile of Ge-based quantum wells. QCSE was experimentally determined on a wide range of samples to show the predictive powers of SQWEAC. Additionally, indirect absorption was also experimentally determined to optimize the physical model for these Ge quantum well devices. In being able to design both 1310 nm and 1550 nm devices using this Ge material system, we provide a platform for designing optoelectronic devices that are Si CMOS compatible and operate over a wide range of wavelengths. These modulators have the capability of providing the large density of information at very low energies per bit required for future interconnect technologies.




Broadband Optical Modulators


Book Description

"provides the full, exciting story of optical modulators. a comprehensive review, from the fundamental science to the material and processing technology to the optimized device design to the multitude of applications for which broadband optical modulators bring great value. Especially valuable in my view is that the authors are internationally




Ge/SiGe Quantum Well Waveguide Modulator for Optical Interconnect Systems


Book Description

Thanks to the development of silicon VLSI technology over the past several decades, we can now integrate far more transistors onto a single chip than ever before. However, this also imposes more stringent requirements, in terms of bandwidth, density, and power consumption, on the interconnect systems that link transistors. The interconnect system is currently one of the major hurdles for the further advancement of the electronic technology. Optical interconnect is considered a promising solution to overcome the interconnect bottleneck. The quantum-confined Stark effect in Ge/SiGe quantum well system paves the way to realize efficient optical modulation on Si in a fully CMOS compatible fashion. In this dissertation, we investigate the integration of Ge/SiGe quantum well waveguide modulators with silicon-on-insulator waveguides. For the first time, we demonstrate the selective epitaxial growth of Ge/SiGe quantum well structures on patterned Si substrates. The selective epitaxy exhibits perfect selectivity and minimal pattern sensitivity. Compared to their counterparts made using bulk epitaxy, the p-i-n diodes from selective epitaxy demonstrate very low reverse leakage current and high reverse breakdown voltage. Strong quantum-confined Stark effect (QCSE) is, for the first time, demonstrated in this material system in the telecommunication C-band at room temperature. A 3 dB optical modulation bandwidth of 2.8 THz is measured, covering more than half of the C-band. We propose, analyze, and experimentally demonstrate a novel approach to realize butt coupling between a SOI waveguide and a selectively grown Ge/SiGe quantum well waveguide modulator using a thin dielectric spacer. Through numerical simulation, we show that the insertion loss penalty for a thin 20 nm thick spacer can be as low as 0.13 dB. Such a quantum well waveguide modulator with a footprint of 8 [Mu]m2 has also been fabricated, demonstrating 3.2 dB modulation contrast with merely 1V swing at a speed of 16 Gpbs.




SiGe, Ge, and Related Compounds 3: Materials, Processing, and Devices


Book Description

Advanced semiconductor technology is depending on innovation and less on "classical" scaling. SiGe, Ge, and Related Compounds have become a key component of the arsenal in improving semiconductor performance. This issue of ECS Transactions discusses the technology to form these materials, process them, FET devices incorporating them, Surfaces and Interfaces, Optoelectronic devices, and HBT devices.




Information Photonics


Book Description

The main aim of this book is to introduce the concept of photonic information processing technologies to the graduate and post-graduate students, researchers, engineers and scientists. It is expected to give the readers an insight into the concepts of photonic techniques of processing as a system, the photonic devices as required components which are applied in the areas of communication, computation and intelligent pattern recognition.




Handbook of Silicon Photonics


Book Description

The development of integrated silicon photonic circuits has recently been driven by the Internet and the push for high bandwidth as well as the need to reduce power dissipation induced by high data-rate signal transmission. To reach these goals, efficient passive and active silicon photonic devices, including waveguide, modulators, photodetectors,




Optical Fiber Telecommunications VII


Book Description

With optical fiber telecommunications firmly entrenched in the global information infrastructure, a key question for the future is how deeply will optical communications penetrate and complement other forms of communication (e.g., wireless access, on-premises networks, interconnects, and satellites). Optical Fiber Telecommunications, the seventh edition of the classic series that has chronicled the progress in the research and development of lightwave communications since 1979, examines present and future opportunities by presenting the latest advances on key topics such as: - Fiber and 5G-wireless access networks - Inter- and intra-data center communications - Free-space and quantum communication links Another key issue is the use of advanced photonics manufacturing and electronic signal processing to lower the cost of services and increase the system performance. To address this, the book covers: - Foundry and software capabilities for widespread user access to photonic integrated circuits - Nano- and microphotonic components - Advanced and nonconventional data modulation formats The traditional emphasis of achieving higher data rates and longer transmission distances are also addressed through chapters on space-division-multiplexing, undersea cable systems, and efficient reconfigurable networking. This book is intended as an ideal reference suitable for university and industry researchers, graduate students, optical systems implementers, network operators, managers, and investors. Quotes: "This book series, which owes much of its distinguished history to the late Drs. Kaminow and Li, describes hot and growing applied topics, which include long-distance and wideband systems, data centers, 5G, wireless networks, foundry production of photonic integrated circuits, quantum communications, and AI/deep-learning. These subjects will be highly beneficial for industrial R&D engineers, university teachers and students, and funding agents in the business sector." Prof. Kenichi IgaPresident (Retired), Tokyo Institute of Technology "With the passing of two luminaries, Ivan Kaminow and Tingye Li, I feared the loss of one of the premier reference books in the field. Happily, this new version comes to chronicle the current state-of-the-art and is written by the next generation of leaders. This is a must-have reference book for anyone working in or trying to understand the field of optical fiber communications technology."Dr. Donald B. Keck Vice President, Corning, Inc. (Retired) "This book is the seventh edition in the definitive series that was previously marshaled by the extraordinary Ivan Kaminow and Tingye Li, both sadly no longer with us. The series has charted the remarkable progress made in the field, and over a billion kilometers of optical fiber currently snake across the globe carrying ever-increasing Internet traffic. Anyone wondering about how we will cope with this incredible growth must read this book." Prof. Sir David Payne Director, Optoelectronics Research Centre, University of Southampton - Updated edition presents the latest advances in optical fiber components, systems, subsystems and networks - Written by leading authorities from academia and industry - Gives a self-contained overview of specific technologies, covering both the state-of-the-art and future research challenges




Silicon Photonics


Book Description

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.




Integrated Interconnect Technologies for 3D Nanoelectronic Systems


Book Description

This cutting-edge book on off-chip technologies puts the hottest breakthroughs in high-density compliant electrical interconnects, nanophotonics, and microfluidics at your fingertips, integrating the full range of mathematics, physics, and technology issues together in a single comprehensive source. You get full details on state-of-the-art I/O interconnects and packaging, including mechanically compliant I/O approaches, fabrication, and assembly, followed by the latest advances and applications in power delivery design, analysis, and modeling. The book explores interconnect structures, materials, and packages for achieving high-bandwidth off-chip electrical communication, including optical interconnects and chip-to-chip signaling approaches, and brings you up to speed on CMOS integrated optical devices, 3D integration, wafer stacking technology, and through-wafer interconnects.




Silicon-Germanium (SiGe) Nanostructures


Book Description

Nanostructured silicon-germanium (SiGe) opens up the prospects of novel and enhanced electronic device performance, especially for semiconductor devices. Silicon-germanium (SiGe) nanostructures reviews the materials science of nanostructures and their properties and applications in different electronic devices.The introductory part one covers the structural properties of SiGe nanostructures, with a further chapter discussing electronic band structures of SiGe alloys. Part two concentrates on the formation of SiGe nanostructures, with chapters on different methods of crystal growth such as molecular beam epitaxy and chemical vapour deposition. This part also includes chapters covering strain engineering and modelling. Part three covers the material properties of SiGe nanostructures, including chapters on such topics as strain-induced defects, transport properties and microcavities and quantum cascade laser structures. In Part four, devices utilising SiGe alloys are discussed. Chapters cover ultra large scale integrated applications, MOSFETs and the use of SiGe in different types of transistors and optical devices.With its distinguished editors and team of international contributors, Silicon-germanium (SiGe) nanostructures is a standard reference for researchers focusing on semiconductor devices and materials in industry and academia, particularly those interested in nanostructures. - Reviews the materials science of nanostructures and their properties and applications in different electronic devices - Assesses the structural properties of SiGe nanostructures, discussing electronic band structures of SiGe alloys - Explores the formation of SiGe nanostructuresfeaturing different methods of crystal growth such as molecular beam epitaxy and chemical vapour deposition