Microwave Excited Plasmas


Book Description

The contrasting examples of microwave plasmas given in this volume demonstrate their capability of not only covering the totality of expressed needs in that particular field, but in many others. For example the ions and reactive neutral species, indispensable for the synergetic effects in etching and deposition processes can be used in metallurgical treatment, and for materials processing in general. They also have the ability to dissociate molecules and excite atoms as required in analytical chemistry where the information on the constituent concentrations is obtained through optical spectroscopy or mass spectrometry. Finally, microwave plasmas can supply the photons for laser and lighting applications. It is noteworthy that microwave plasmas cover an impressive pressure range of eight orders of magnitude from 10-3 Pa (10-5 torr) to above atmospheric pressure. The versatility of microwave plasmas, their moderate cost, and their ease of implementation particularly appeal to the industrial entrepreneur. As well as providing a review of current developments, the work proposes a synthesis on microwave discharges, laying out the corresponding physical references without developing too much plasma theory. It will be of interest both to the user, who may not be overly concerned about plasma science, and to the plasma expert, who may wish to redirect his interest towards plasma applications, such as materials processing.




Microwave Induced Plasma Analytical Spectrometry


Book Description

This book is the most comprehensive publication on MWP technology and MWP-OES analytical spectrometry with an emphasis on practical issues.




Microwave Discharges


Book Description

Proceedings of a NATO ARW held in Vimeiro, Portugal, May 11-15, 1992




High Density Plasma Sources


Book Description

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.




Advanced Technologies Based on Wave and Beam Generated Plasmas


Book Description

This book draws together three areas of work on plasma technologies: advanced efforts based on wave generated, high frequency plasmas, plasma assisted ion implantation, and electron beam generated plasma. It lays a foundation for the application of sources in industry and various research areas







Photon, Beam and Plasma Assisted Processing


Book Description

This symposium attracted 82 papers which were presented orally or as posters. Fourteen invited speakers presented state of the art reviews and aspects of future key topics in this increasingly important area of materials science. The high level of scientific presentation during the conference enhanced the aim of the symposium, which was to stimulate discussion amongst materials scientists, chemists, engineers and physicists with a common interest in this field and to disseminate knowledge of progress.




Plasma Technology for Hyperfunctional Surfaces


Book Description

Based on a project backed by the European Union, this is a must-have resource for researchers in industry and academia concerned with application-oriented plasma technology research. Clearly divided in three sections, the first part is dedicated to the fundamentals of plasma and offers information about scientific and theoretical plasma topics, plasma production, surface treatment process and characterization. The second section focuses on technological aspects and plasma process applications in textile, food packaging and biomedical sectors, while the final part is devoted to concerns about the environmental sustainability of plasma processes.




Plasma Processing of Semiconductors


Book Description

Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.