Physics and Technology of High-k Gate Dielectrics 7
Author : Samares Kar
Publisher :
Page : 493 pages
File Size : 42,44 MB
Release : 2009
Category :
ISBN : 9781607680932
Author : Samares Kar
Publisher :
Page : 493 pages
File Size : 42,44 MB
Release : 2009
Category :
ISBN : 9781607680932
Author : Samares Kar
Publisher : The Electrochemical Society
Page : 0 pages
File Size : 32,62 MB
Release : 2009-09
Category : Dielectrics
ISBN : 9781566777438
This issue of ECS Transactions covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility channels, work function and flat-band voltage control, novel and higher permittivity dielectric materials, interface issues, gate stack reliability, DRAM, non-volatile memories, and exploratory applications.
Author : S. Kar
Publisher : The Electrochemical Society
Page : 550 pages
File Size : 47,64 MB
Release : 2008-10
Category : Dielectrics
ISBN : 1566776511
The issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, novel and still higher permittivity dielectric materials, CMOS processing with high-K layers, metals for gate electrodes, interface issues, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Author : Samares Kar
Publisher : The Electrochemical Society
Page : 676 pages
File Size : 25,72 MB
Release : 2007
Category : Dielectrics
ISBN : 1566775701
This issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Author : Samares Kar
Publisher :
Page : 330 pages
File Size : 31,87 MB
Release : 2003
Category : Science
ISBN :
Author : Samares Kar
Publisher : The Electrochemical Society
Page : 512 pages
File Size : 10,87 MB
Release : 2004
Category : Science
ISBN : 9781566774055
"This volume is the proceedings of The Second International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues ... and was held during [the] 204th Meeting [of the Electrochemical Society] ..."--P. v.
Author : Samares Kar
Publisher : The Electrochemical Society
Page : 565 pages
File Size : 49,63 MB
Release : 2006
Category : Dielectrics
ISBN : 1566775035
This issue covers, in detail, all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Author :
Publisher :
Page : 547 pages
File Size : 23,64 MB
Release : 2006
Category : Dielectrics
ISBN :
Author : Samares Kar
Publisher : Springer Science & Business Media
Page : 515 pages
File Size : 24,93 MB
Release : 2013-06-25
Category : Technology & Engineering
ISBN : 3642365353
"The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, metal gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack materials, ternary hafnia and lanthania based high-k gate stack films, crystalline high-k oxides, high mobility substrates, and parameter extraction. Each chapter begins with the basics necessary for understanding the topic, followed by a comprehensive review of the literature, and ultimately graduating to the current status of the technology and our scientific understanding and the future prospects." .
Author : Gang He
Publisher : John Wiley & Sons
Page : 560 pages
File Size : 31,34 MB
Release : 2012-08-10
Category : Technology & Engineering
ISBN : 3527646361
A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.