A Self-consistent Kinetic Theory of Dc and Rf Glow Discharge Plasmas
Author : Timothy John Sommerer
Publisher :
Page : 310 pages
File Size : 42,57 MB
Release : 1990
Category :
ISBN :
Author : Timothy John Sommerer
Publisher :
Page : 310 pages
File Size : 42,57 MB
Release : 1990
Category :
ISBN :
Author : Uwe Kortshagen
Publisher : Springer
Page : 553 pages
File Size : 14,25 MB
Release : 2006-04-11
Category : Science
ISBN : 0306470764
This book resulted from the NATO Advanced Research Workshop on “Electron Kinetics and Applications of Glow Discharges,” held in St. Petersburg, Russia, on May 19-23, 1997. Glow discharges have found widespread applications in many technological processes from the manufacture of semiconductors, to recent developments in na- technology, to the traditional fields of gas lasers, and discharge lamps. Consequently, the interest in the physics of glow discharges has experienced yet another resurgence of interest. While the non-equilibrium character of glow discharges is widely accepted, the opinion still prevails that the main features can be captured by fluid models, and that kinetic treatments are only required for the understanding of subtle details. The erroneousness of this belief is demonstrated by the failure of fluid models to describe many basic features of glow discharges such as, for instance, electrode phenomena, striations, and collisionless heating effects. An adequate description of glow discharges thus has to be of kinetic nature.
Author :
Publisher :
Page : 842 pages
File Size : 46,93 MB
Release : 1995
Category : Chemistry
ISBN :
Reports NIST research and development in the physical and engineering sciences in which the Institute is active. These include physics, chemistry, engineering, mathematics, and computer sciences. Emphasis on measurement methodology and the basic technology underlying standardization.
Author : James K. Olthoff
Publisher : DIANE Publishing
Page : 181 pages
File Size : 26,10 MB
Release : 1996
Category :
ISBN : 078812708X
The GEC RF Reference Cell is a parallel plate, capacity-coupled, rf plasma reactor that, in principle, is suitable for studies of basic discharge phenomena, investigation of industrial-type plasmas, and theoretical modeling. This report contains 12 articles that review nearly all of the experiments and theoretical modeling efforts that have been performed over the last 5 years using GEC cells. Together, they serve as a "users' guide" to the operation and performance of the GEC cell.
Author :
Publisher :
Page : 1538 pages
File Size : 17,21 MB
Release : 2003
Category : Physics
ISBN :
Author :
Publisher :
Page : 516 pages
File Size : 49,41 MB
Release : 1992
Category : Electric discharges through gases
ISBN :
Author :
Publisher :
Page : 776 pages
File Size : 15,85 MB
Release : 1995
Category : Dissertations, Academic
ISBN :
Author : P.F. Williams
Publisher : Springer Science & Business Media
Page : 610 pages
File Size : 14,59 MB
Release : 2013-11-11
Category : Technology & Engineering
ISBN : 9401158843
Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Author : Vladimir Nikolaevich Ochkin
Publisher : SPIE-International Society for Optical Engineering
Page : 366 pages
File Size : 21,58 MB
Release : 2002
Category : Science
ISBN :
Author : B. D. Sartwell
Publisher : Elsevier
Page : 665 pages
File Size : 28,56 MB
Release : 2016-06-03
Category : Technology & Engineering
ISBN : 1483274640
Surface & Coatings Technology, Volumes 59–60 presents the proceedings of the Third International Conference on Plasma Surface Engineering, held in Garmisch-Partenkirchen, Germany, on October 26–29, 1992. This book discusses the widespread applications of plasma and particle beam assisted methods in surface and thin film technology. Volume 59 is organized into 11 parts encompassing 69 chapters while Volume 60 is comprised of eight parts encompassing 49 chapters. This compilation of papers begins with an overview of the kinetic modelling of low pressure high frequency discharges. This text then examines the effect of various deposition parameters on the growth of chamber wall deposits. Other chapters consider the physiochemical behavior of ceramic materials for space applications. This book discusses as well the economic aspects of the application of plasma surface technologies. The reader is also introduced to the environmental aspects of physical vapor deposition coating technology. This book is a valuable resource for plasma surface engineers, technologists, and researchers.