Analysis of Glow Discharges for Understanding the Process of Film Formation
Author : Mundiyath Venugopalan
Publisher :
Page : 130 pages
File Size : 18,97 MB
Release : 1984
Category : Glow discharges
ISBN :
Author : Mundiyath Venugopalan
Publisher :
Page : 130 pages
File Size : 18,97 MB
Release : 1984
Category : Glow discharges
ISBN :
Author : Freddy Adams
Publisher : Elsevier
Page : 493 pages
File Size : 23,62 MB
Release : 2015-06-06
Category : Science
ISBN : 0444634509
Chemical Imaging Analysis covers the advancements made over the last 50 years in chemical imaging analysis, including different analytical techniques and the ways they were developed and refined to link the composition and structure of manmade and natural materials at the nano/micro scale to the functional behavior at the macroscopic scale. In a development process that started in the early 1960s, a variety of specialized analytical techniques was developed – or adapted from existing techniques – and these techniques have matured into versatile and powerful tools for visualizing structural and compositional heterogeneity. This text explores that journey, providing a general overview of imaging techniques in diverse fields, including mass spectrometry, optical spectrometry including X-rays, electron microscopy, and beam techniques. - Provides comprehensive coverage of analytical techniques used in chemical imaging analysis - Explores a variety of specialized techniques - Provides a general overview of imaging techniques in diverse fields
Author : Richard Payling
Publisher : John Wiley & Sons
Page : 904 pages
File Size : 30,78 MB
Release : 1997-12-08
Category : Science
ISBN :
Glow Discharge Optical Emission Spectrometry (GD-OES) is rapidly becoming one of the most important techniques for the direct analysis of solids. This, the first book entirely devoted to the subject, represents the combined contributions of over 30 specialists from around the world. All contributors are active in the field and recognised internationally for their expertise and knowledge in GD-OES. The book begins with an introductory overview of the subjects, deals with the design of the instrument, its operation and analytical methods and describes in detail the complex plasma processes which occur inside the glow discharge source. The second part of the book is more practically orientated, showing the full range of uses for GD-OES from the bulk analysis of virtually any solid material to depth profiling within the first tens of micrometres of a variety of surfaces and coatings. Glow Discharge Optical Emission Spectrometry is intended for a wide audience of scientists, engineers and postgraduate students and will be a valuable and challenging reference work for both experienced users of the technique and newcomers alike.
Author : R. Kenneth Marcus
Publisher : John Wiley & Sons
Page : 498 pages
File Size : 33,60 MB
Release : 2003-05-27
Category : Science
ISBN : 0470857862
This multi-author, edited volume includes chapters which deal with both basic and highly complex applications. Glow discharge devices are now being used in very novel ways for the analysis of liquids and gases, including molecular species detection and identification, an area that was beyond the perceived scope of applicability just ten years ago. It is expected that the next decade will see a growth in the interest and application of glow discharge devices far surpassing the expectations of the last century. Responding to the rapid growth in the field Includes both GD-MS and GD-AES In-depth coverage of applications Co-edited by the top names in the field in Europe and US, with high calibre contributions from around the world
Author : R. G. Frieser
Publisher :
Page : 380 pages
File Size : 41,37 MB
Release : 1981
Category : Plasma engineering
ISBN :
Author : D.J. O'Connor
Publisher : Springer Science & Business Media
Page : 457 pages
File Size : 31,12 MB
Release : 2013-04-17
Category : Science
ISBN : 3662027674
The idea for this book stemmed from a remark by Philip Jennings of Murdoch University in a discussion session following a regular meeting of the Australian Surface Science group. He observed that a text on surface analysis and applica tions to materials suitable for final year undergraduate and postgraduate science students was not currently available. Furthermore, the members of the Australian Surface Science group had the research experience and range of coverage of sur face analytical techniques and applications to provide a text for this purpose. A of techniques and applications to be included was agreed at that meeting. The list intended readership of the book has been broadened since the early discussions, particularly to encompass industrial users, but there has been no significant alter ation in content. The editors, in consultation with the contributors, have agreed that the book should be prepared for four major groups of readers: - senior undergraduate students in chemistry, physics, metallurgy, materials science and materials engineering; - postgraduate students undertaking research that involves the use of analytical techniques; - groups of scientists and engineers attending training courses and workshops on the application of surface analytical techniques in materials science; - industrial scientists and engineers in research and development seeking a description of available surface analytical techniques and guidance on the most appropriate techniques for particular applications. The contributors mostly come from Australia, with the notable exception of Ray Browning from Stanford University.
Author : Uwe Kortshagen
Publisher : Springer
Page : 553 pages
File Size : 42,23 MB
Release : 2006-04-11
Category : Science
ISBN : 0306470764
This book resulted from the NATO Advanced Research Workshop on “Electron Kinetics and Applications of Glow Discharges,” held in St. Petersburg, Russia, on May 19-23, 1997. Glow discharges have found widespread applications in many technological processes from the manufacture of semiconductors, to recent developments in na- technology, to the traditional fields of gas lasers, and discharge lamps. Consequently, the interest in the physics of glow discharges has experienced yet another resurgence of interest. While the non-equilibrium character of glow discharges is widely accepted, the opinion still prevails that the main features can be captured by fluid models, and that kinetic treatments are only required for the understanding of subtle details. The erroneousness of this belief is demonstrated by the failure of fluid models to describe many basic features of glow discharges such as, for instance, electrode phenomena, striations, and collisionless heating effects. An adequate description of glow discharges thus has to be of kinetic nature.
Author :
Publisher :
Page : 300 pages
File Size : 36,96 MB
Release : 1991
Category : Aeronautics
ISBN :
Author :
Publisher :
Page : 526 pages
File Size : 24,81 MB
Release : 1997
Category : Chemistry
ISBN :
Reports NIST research and development in the physical and engineering sciences in which the Institute is active. These include physics, chemistry, engineering, mathematics, and computer sciences. Emphasis on measurement methodology and the basic technology underlying standardization.
Author : Y. Pauleau
Publisher : Springer Science & Business Media
Page : 372 pages
File Size : 37,36 MB
Release : 2012-12-06
Category : Technology & Engineering
ISBN : 940100353X
An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.