Electron-beam, X-ray, and Ion-beam Submicrometer Lithographies for Manufacturing
Author :
Publisher :
Page : 440 pages
File Size : 14,82 MB
Release : 1994
Category : Ion beam lithography
ISBN :
Author :
Publisher :
Page : 440 pages
File Size : 14,82 MB
Release : 1994
Category : Ion beam lithography
ISBN :
Author :
Publisher :
Page : 434 pages
File Size : 33,64 MB
Release : 1996
Category : Integrated circuits
ISBN :
Author : John M. Warlaumont
Publisher : SPIE-International Society for Optical Engineering
Page : 472 pages
File Size : 39,7 MB
Release : 1995
Category : Technology & Engineering
ISBN : 9780819417855
Author : Vivek Bakshi
Publisher : SPIE Press
Page : 704 pages
File Size : 25,27 MB
Release : 2009
Category : Art
ISBN : 0819469645
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Author : Douglas J. Resnick
Publisher : SPIE-International Society for Optical Engineering
Page : 364 pages
File Size : 22,64 MB
Release : 1990
Category : Technology & Engineering
ISBN :
Author : Phillip D. Blais
Publisher : SPIE-International Society for Optical Engineering
Page : 236 pages
File Size : 39,86 MB
Release : 1985
Category : Technology & Engineering
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Author : Martin Charles Peckerar
Publisher :
Page : 340 pages
File Size : 23,99 MB
Release : 1991
Category : Ion beam lithography
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Author : Phillip D. Blais
Publisher :
Page : 280 pages
File Size : 13,75 MB
Release : 1987
Category : Technology & Engineering
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Author : Phillip D. Blais
Publisher :
Page : 294 pages
File Size : 10,61 MB
Release : 1986
Category : Technology & Engineering
ISBN :
Author : Arnold W. Yanof
Publisher :
Page : 340 pages
File Size : 14,71 MB
Release : 1988
Category : Technology & Engineering
ISBN :