Emerging Lithographic Technologies
Author :
Publisher :
Page : 540 pages
File Size : 45,53 MB
Release : 2007
Category : Lithography
ISBN :
Emerging Lithographic Technologies VIII
Author :
Publisher :
Page : 602 pages
File Size : 38,54 MB
Release : 2004
Category : Lithography, Electron beam
ISBN :
Book Description
Nanolithography
Author : M Feldman
Publisher : Woodhead Publishing
Page : 599 pages
File Size : 50,43 MB
Release : 2014-02-13
Category : Technology & Engineering
ISBN : 0857098756
Book Description
Integrated circuits, and devices fabricated using the techniques developed for integrated circuits, have steadily gotten smaller, more complex, and more powerful. The rate of shrinking is astonishing – some components are now just a few dozen atoms wide. This book attempts to answer the questions, "What comes next? and "How do we get there?Nanolithography outlines the present state of the art in lithographic techniques, including optical projection in both deep and extreme ultraviolet, electron and ion beams, and imprinting. Special attention is paid to related issues, such as the resists used in lithography, the masks (or lack thereof), the metrology needed for nano-features, modeling, and the limitations caused by feature edge roughness. In addition emerging technologies are described, including the directed assembly of wafer features, nanostructures and devices, nano-photonics, and nano-fluidics.This book is intended as a guide to the researcher new to this field, reading related journals or facing the complexities of a technical conference. Its goal is to give enough background information to enable such a researcher to understand, and appreciate, new developments in nanolithography, and to go on to make advances of his/her own. - Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions - Covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography - Describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics
Chemistry and Lithography
Author : Uzodinma Okoroanyanwu
Publisher : SPIE Press
Page : 0 pages
File Size : 26,95 MB
Release : 2011-03-08
Category : Technology & Engineering
ISBN : 9781118030028
Book Description
Chemistry and Lithography provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a wide readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology. Part I presents several important chemical and physical principles involved in the invention and evolution of lithography. Part II covers the processes for the synthesis, manufacture, usage, and handling of lithographic chemicals and materials. Part III investigates several important chemical and physical principles involved in the practice of lithography. Chemistry and Lithography is a useful reference for anyone working in the semiconductor industry.
Optical and EUV Lithography
Author : Andreas Erdmann
Publisher :
Page : pages
File Size : 18,77 MB
Release : 2021-02
Category :
ISBN : 9781510639010
Book Description
Alternative Lithography
Author : Clivia M. Sotomayor Torres
Publisher : Springer Science & Business Media
Page : 343 pages
File Size : 27,43 MB
Release : 2012-12-06
Category : Science
ISBN : 1441992049
Book Description
Good old Gutenberg could not have imagined that his revolutionary printing concept which so greatly contributed to dissemination of knowledge and thus today 's wealth, would have been a source of inspiration five hundred years later. Now, it seems intuitive that a simple way to produce a large number of replicates is using a mold to emboss pattern you need, but at the nanoscale nothing is simple: the devil is in the detail. And this book is about the "devil". In the following 17 chapters, the authors-all of them well recognized and active actors in this emerging field-describe the state-of-the-art, today 's technological bottlenecks and the prospects for micro-contact printing and nanoimprint lithography. Many results of this book originate from projects funded by the European Com mission through its "Nanotechnology Information Devices" (NID) initiative. NID was launched with the objective to develop nanoscale devices for the time when the red brick scenario of the ITRS roadmap would be reached. It became soon clear however, that there was no point to investigate only alternative devices to CMOS, but what was really needed was an integrated approach that took into account more facets of this difficult undertaking. Technologically speaking , this meant to have a coherent strategy to develop novel devices, nanofabrication tools and circuit & system architectures at the same time.
Nanocoatings and Ultra-Thin Films
Author : Abdel Salam Hamdy Makhlouf
Publisher : Elsevier
Page : 449 pages
File Size : 42,45 MB
Release : 2011-09-14
Category : Science
ISBN : 0857094904
Book Description
Coatings are used for a wide range of applications, from anti-fogging coatings for glass through to corrosion control in the aerospace and automotive industries. Nanocoatings and ultra-thin films provides an up-to-date review of the fundamentals, processes of deposition, characterisation and applications of nanocoatings.Part one covers technologies used in the creation and analysis of thin films, including chapters on current and advanced coating technologies in industry, nanostructured thin films from amphiphilic molecules, chemical and physical vapour deposition methods and methods for analysing nanocoatings and ultra-thin films. Part two focuses on the applications of nanocoatings and ultra-thin films, with chapters covering topics such as nanocoatings for architectural glass, packaging applications, conventional and smart nanocoatings for corrosion protection in aerospace engineering and ultra-thin membranes for sensor applications.With its distinguished editors and international team of contributors, Nanocoatings and ultra-thin films is an essential reference for professional engineers in the glazing, consctruction, electronics and transport industries, as well as all those with an academic research interest in the field. - Provides an up-to-date review of the fundamentals, processes of deposition, characterisation and applications of nanocoatings - Focuses on the applications of nanocoatings and ultra-thin films, covering topics such as nanocoatings for architectural glass, packaging applications and ultra-thin membranes for sensor applications - Includes chapters on current and advanced coating technologies in industry, nanostructured thin films from amphiphilic molecules, chemical and physical vapour deposition methods and methods for analysing nanocoatings and ultra-thin films
Lithography
Author : Stefan Landis
Publisher : John Wiley & Sons
Page : 311 pages
File Size : 20,47 MB
Release : 2013-03-04
Category : Technology & Engineering
ISBN : 1118621182
Book Description
Lithography is now a complex tool at the heart of a technological process for manufacturing micro and nanocomponents. A multidisciplinary technology, lithography continues to push the limits of optics, chemistry, mechanics, micro and nano-fluids, etc. This book deals with essential technologies and processes, primarily used in industrial manufacturing of microprocessors and other electronic components.
Nanoelectrochemistry
Author : Michael V. Mirkin
Publisher : CRC Press
Page : 852 pages
File Size : 12,76 MB
Release : 2015-03-27
Category : Science
ISBN : 146656122X
Book Description
Nanoscale electrochemistry has revolutionized electrochemical research and technologies and has impacted other fields, including nanotechnology and nanoscience, biology, and materials chemistry. This book examines well-established concepts and principles and provides an updated overview of the field and its applications. The first two chapters contain theoretical background, specifically, theories of electron transfer, transport, and double-layer processes at nanoscale electrochemical interfaces. The next chapters examine the electrochemical studies of nanomaterials and nanosystems, as well as the applications of nanoelectrochemical techniques. Each chapter can be read independently, providing readers with a compact, up-to-date review of th
Materials and Processes for Next Generation Lithography
Author :
Publisher : Elsevier
Page : 636 pages
File Size : 16,69 MB
Release : 2016-11-08
Category : Science
ISBN : 0081003587
Book Description
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
