Ferroelectric and Ferromagnetic Behavior of Oxide Containing Thin Films


Book Description

Oxide materials are important due to their interesting physical properties for applications in future electronic devices. Thin film oxide materials show a variety of electric and magnetic properties such as ferroelectric, piezoelectric, ferromagnetic and superconducting properties. One intriguing material, bismuth ferrite, has shown room-temperature multiferroic order. It has ferroelectric order below the 1100 K Curie temperature and large remnant polarization. Also, it has antiferromagnetic order below the Néel temperature of 650 K. However, the bismuth ferrite has several defect-related issues such as bismuth volatilization, transition of iron valence electron states and oxygen vacancies. The multiferroic properties are changed by the defect states of the thin films. In this study, the valence electron transition of iron and oxygen vacancy is investigated. Exchange bias is one of the important phenomena in magnetic materials. The exchange bias is formed from exchange anisotropy between ferromagnetic and antiferromagnetic materials and observed with field-cooling to temperatures lower than the Néel temperature of the antiferromagnetic material. In thin film materials, the phenomenon is also affected by substrate conditions. In this study, the exchange bias is investigated for Co/CoO bilayer thin films on flat substrates and modulated substrates.




Ferroelectric Thin Films


Book Description

The impetus for the rapid development of thin film technology, relative to that of bulk materials, is its application to a variety of microelectronic products. Many of the characteristics of thin film ferroelectric materials are utilized in the development of these products - namely, their nonvolatile memory and piezoelectric, pyroelectric, and electro-optic properties. It is befitting, therefore, that the first of a set of three complementary books with the general title Integrated Ferroelectric Devices and Technologies focuses on the synthesis of thin film ferroelectric materials and their basic properties. Because it is a basic introduction to the chemistry, materials science, processing, and physics of the materials from which integrated ferroelectrics are made, newcomers to this field as well as veterans will find this book self-contained and invaluable in acquiring the diverse elements requisite to success in their work in this area. It is directed at electronic engineers and physicists as well as process and system engineers, ceramicists, and chemists involved in the research, design, development, manufacturing, and utilization of thin film ferroelectric materials.




Thin Film Metal-Oxides


Book Description

Thin Film Metal-Oxides provides a representative account of the fundamental structure-property relations in oxide thin films. Functional properties of thin film oxides are discussed in the context of applications in emerging electronics and renewable energy technologies. Readers will find a detailed description of deposition and characterization of metal oxide thin films, theoretical treatment of select properties and their functional performance in solid state devices, from leading researchers. Scientists and engineers involved with oxide semiconductors, electronic materials and alternative energy will find Thin Film Metal-Oxides a useful reference.




Thin Films and Heterostructures for Oxide Electronics


Book Description

Oxides form a broad subject area of research and technology development which encompasses different disciplines such as materials science, solid state chemistry, physics etc. The aim of this book is to demonstrate the interplay of these fields and to provide an introduction to the techniques and methodologies involving film growth, characterization and device processing. The literature in this field is thus fairly scattered in different research journals covering one or the other aspect of the specific activity. This situation calls for a book that will consolidate this information and thus enable a beginner as well as an expert to get an overall perspective of the field, its foundations, and its projected progress.




Formation of Ferroelectricity in Hafnium Oxide Based Thin Films


Book Description

In 2011, Böscke et al. reported the unexpected discovery of ferroelectric properties in hafnia based thin films, which has since initiated many further studies and revitalized research on the topic of ferroelectric memories. In spite of many efforts, the unveiling of the fundamentals behind this surprising discovery has proven rather challenging. In this work, the originally claimed Pca21 phase is experimentally proven to be the root of the ferroelectric properties and the nature of this ferroelectricity is classified in the frame of existing concepts of ferroelectric materials. Parameters to stabilize this polar phase are examined from a theoretical and fabrication point of view. With these very basic questions addressed, the application relevant electric field cycling behavior is studied. The results of first-order reversal curves, impedance spectroscopy, scanning transmission electron microscopy and piezoresponse force microscopy significantly advance the understanding of structural mechanisms underlying wake-up, fatigue and the novel phenomenon of split-up/merging of transient current peaks. The impact of field cycling behavior on applications like ferroelectric memories is highlighted and routes to optimize it are derived. These findings help to pave the road for a successful commercialization of hafnia based ferroelectrics.




Magnetic, Ferroelectric, and Multiferroic Metal Oxides


Book Description

Magnetic, Ferroelectric, and Multiferroic Metal Oxides covers the fundamental and theoretical aspects of ferroics and magnetoelectrics, their properties, and important technological applications, serving as the most comprehensive, up-to-date reference on the subject. Organized in four parts, Dr. Biljana Stojanovic leads expert contributors in providing the context to understand the material (Part I: Introduction), the theoretical and practical aspects of ferroelectrics (Part II: Ferroelectrics: From Theory, Structure and Preparation to Application), magnetic metal oxides (Part III: Magnetic Oxides: Ferromagnetics, Antiferromagnetics and Ferrimagnetics), multiferroics (Part IV: Multiferroic Metal Oxides) and future directions in research and application (Part V: Future of Metal Oxide Ferroics and Multiferroics). As ferroelectric materials are used to make capacitors with high dielectric constant, transducers, and actuators, and in sensors, reed heads, and memories based on giant magnetoresistive effects, this book will provide an ideal source for the most updated information. Addresses ferroelectrics, ferromagnetics and multiferroelectrics, providing a one-stop reference for researchers Provides fundamental theory and relevant, important technological applications Highlights their use in capacitors with high dielectric constant, transducers, and actuators, and in sensors, reed heads, and memories based on giant magnetoresistive effects




Oxide Ultrathin Films


Book Description

A wealth of information in one accessible book. Written by international experts from multidisciplinary fields, this in-depth exploration of oxide ultrathin films covers all aspects of these systems, starting with preparation and characterization, and going on to geometrical and electronic structure, as well as applications in current and future systems and devices. From the Contents: Synthesis and Preparation of Oxide Ultrathin Films Characterization Tools of Oxide Ultrathin Films Ordered Oxide Nanostructures on Metal Surfaces Unusual Properties of Oxides and Other Insulators in the Ultrathin Limit Silica and High-K Dielectrics Thin Films in Microelectronics Oxide Passive Films and Corrosion Protection Oxide Films as Catalytic Materials and as Models of Real Catalysts Oxide Films in Spintronics Oxide Ultrathin Films in Solid Oxide Fuel Cells Transparent Conducting and Chromogenic Oxide Films as Solar Energy Materials Oxide Ultrathin Films in Sensor Applications Ferroelectricity in Ultrathin Film Capacitors Titania Thin Films in Biocompatible Materials and Medical Implants Oxide Nanowires for New Chemical Sensor Devices







Multicomponent Oxide Films for Electronics: Volume 574


Book Description

The exceptional properties of multicomponent oxides, combined with the inability of simpler materials to meet the increasing demands of the electronics industry, have motivated tremendous interest and activity in utilizing multicomponent oxides for electronic applications. For these applications, it is often desirable to integrate complex oxides in thin-film form with other materials. This book focuses on common materials issues involved in the processing and characterization of multicomponent oxides and how these issues relate to device applications. Papers range from theoretical explanations of the magnetic and electronic properties of transition metal oxides, to integration with silicon technology. Noteworthy is the progress being made in the deposition and characterization of these complex materials, as well as their applicability in ferroelectric memories, MOSFETs, optical devices, infrared imaging arrays, etc. Topics include: epitaxial multicomponent oxide film growth; properties, characterization and modeling; properties of multicomponent oxides; and multicomponent oxide devices.




Strain-induced Phenomenon in Complex Oxide Thin Films


Book Description

Complex oxide materials wield an immense spectrum of functional properties such as ferroelectricity, ferromagnetism, magnetoelectricity, optoelectricity, optomechanical, magnetoresistance, superconductivity, etc. The rich coupling between charge, spin, strain, and orbital degrees of freedom makes this material class extremely desirable and relevant for next generation electronic devices and technologies which are trending towards nanoscale dimensions. Development of complex oxide thin film materials is essential for realizing their integration into nanoscale electronic devices, where theoretically predicted multifunctional capabilities of oxides could add tremendous value. Employing thin film growth strategies such as epitaxial strain and heterostructure interface engineering can greatly enhance and even unlock novel material properties in complex oxides, which will be the main focus of this work. However, physically incorporating oxide materials into devices remains a challenge. While advancements in molecular beam epitaxy (MBE) of thin film oxide materials has led to the ability to grow oxide materials with atomic layer precision, there are still major limitations such as controlling stoichiometric compositions during growth as well as creating abrupt interfaces in multi-component layered oxide structures. The work done in this thesis addresses ways to overcome these limitations in order to harness intrinsic material phenomena.The development of adsorption-controlled stoichiometric growth windows of CaTiO3 and SrTiO3 thin film materials grown by hybrid MBE where Ti is supplied using metal-organic titatnium tetraisopropoxide material is thoroughly outlined. These growth windows enable superior epitaxial strain-induced ferroelectric and dielectric properties to be accessed as demonstrated by chemical, structural, electrical, and optical characterization techniques. For tensile strained CaTiO3 and compressive strained SrTiO3 films, the critical effects of nonstoichiometry on ferroelectric properties are investigated, where enhanced ferroelectric responses are only found for stoichiometric films grown inside of the growth windows, whereas outside of the optimal growth window conditions, ferroelectric properties are greatly deteriorated and eventually disappear for highly nonstoichiometric film compositions. Utilizing these stoichiometric growth windows, high temperature polar phase transitions are discovered for compressively strained CaTiO3 films with transition temperatures in excess of 700 K, rendering this material as a strong candidate for high temperature electronic applications. Beyond the synthesis of single phase materials using hybrid MBE, a methodology is presented for constructing layered (SrTiO3)n/(CaTiO3)n superlattice structures, where precise control over the unit cell layering thickness (n) is demonstrated using in-situ reflection high energy electron diffraction. The effects of interface roughness and layering periodicity (n) on the strain-induced ferroelectric properties for a series of n=1-10 (SrTiO3)n/(CaTiO3)n superlattice films are investigated. It is found that the stabilization of a ferroelectric phase is independent of n, but is however strongly dominated by the degree of interface roughness which is quantified by measuring the highest nth order X-ray diffraction peak splitting of each superlattice film. A counter-intuitive realization is made whereby a critical amount of interface roughness is required in order to enable the formation of the predicted strain-stabilized ferroelectric phase, whereas sharp interfaces actually suppress this ferroelectric phase from manifesting. It is shown how high-quality complex oxide superlattices can be constructed using hybrid MBE technique, allowing the ability to control layered materials at the atomic scale. Furthermore, a detailed growth methodology is provided for constructing a layered n=4 SrO(SrTiO3)n Ruddlesden-Popper (RP) phase by hybrid MBE, where the ability to deposit single monolayers of SrO and TiO2 is utilized to build the RP film structure over a time period of 5 hours. This is the first time that a thin film RP phase has been grown using hybrid MBE, where an a stable control over the fluxes is demonstrated during relatively long time periods of growth, which advantageously facilitates the synthesis of high-quality RP materials with excellent structural and chemical homogeneity.Additionally, this work demonstrates some major advancements in optical second harmonic generation (SHG) characterization techniques of ferroelectric thin film materials. The SHG characterization techniques developed here proved to be the bread-and-butter for most of the work performed in this thesis, providing a powerful tool for identifying the existence of strain-induced ferroelectric phases, including their temperature dependence and polar symmetry. The work presented in this dissertation will hopefully provide a preliminary road map for future hybrid MBE growers, scientists and researchers, to develop and investigate epitaxial strain and heterostructure layering induced phenomena in other complex oxide systems.