Interconnect and Contact Metallization for ULSI
Author : G. S. Mathad
Publisher : The Electrochemical Society
Page : 358 pages
File Size : 32,22 MB
Release : 2000
Category : Science
ISBN : 9781566772549
Author : G. S. Mathad
Publisher : The Electrochemical Society
Page : 358 pages
File Size : 32,22 MB
Release : 2000
Category : Science
ISBN : 9781566772549
Author : Mikhail Baklanov
Publisher : John Wiley & Sons
Page : 616 pages
File Size : 31,42 MB
Release : 2012-02-17
Category : Technology & Engineering
ISBN : 1119966868
Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served well, allowing for the creation of Ultra Large Scale Integration (ULSI) devices which combine over a billion transistors onto a single chip, the increased resistance and RC-delay at the smaller scale has become a significant factor affecting chip performance. Advanced Interconnects for ULSI Technology is dedicated to the materials and methods which might be suitable replacements. It covers a broad range of topics, from physical principles to design, fabrication, characterization, and application of new materials for nano-interconnects, and discusses: Interconnect functions, characterisations, electrical properties and wiring requirements Low-k materials: fundamentals, advances and mechanical properties Conductive layers and barriers Integration and reliability including mechanical reliability, electromigration and electrical breakdown New approaches including 3D, optical, wireless interchip, and carbon-based interconnects Intended for postgraduate students and researchers, in academia and industry, this book provides a critical overview of the enabling technology at the heart of the future development of computer chips.
Author : Harzara S. Rathore
Publisher : The Electrochemical Society
Page : 292 pages
File Size : 49,27 MB
Release : 1998
Category : Computers
ISBN : 9781566771849
Author : Mikhail Baklanov
Publisher : John Wiley & Sons
Page : 616 pages
File Size : 29,45 MB
Release : 2012-04-02
Category : Technology & Engineering
ISBN : 0470662549
Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served well, allowing for the creation of Ultra Large Scale Integration (ULSI) devices which combine over a billion transistors onto a single chip, the increased resistance and RC-delay at the smaller scale has become a significant factor affecting chip performance. Advanced Interconnects for ULSI Technology is dedicated to the materials and methods which might be suitable replacements. It covers a broad range of topics, from physical principles to design, fabrication, characterization, and application of new materials for nano-interconnects, and discusses: Interconnect functions, characterisations, electrical properties and wiring requirements Low-k materials: fundamentals, advances and mechanical properties Conductive layers and barriers Integration and reliability including mechanical reliability, electromigration and electrical breakdown New approaches including 3D, optical, wireless interchip, and carbon-based interconnects Intended for postgraduate students and researchers, in academia and industry, this book provides a critical overview of the enabling technology at the heart of the future development of computer chips.
Author : Yosi Shacham-Diamand
Publisher : Springer Science & Business Media
Page : 545 pages
File Size : 50,9 MB
Release : 2009-09-19
Category : Science
ISBN : 0387958681
In Advanced ULSI interconnects – fundamentals and applications we bring a comprehensive description of copper-based interconnect technology for ultra-lar- scale integration (ULSI) technology for integrated circuit (IC) application. In- grated circuit technology is the base for all modern electronics systems. You can ?nd electronics systems today everywhere: from toys and home appliances to a- planes and space shuttles. Electronics systems form the hardware that together with software are the bases of the modern information society. The rapid growth and vast exploitation of modern electronics system create a strong demand for new and improved electronic circuits as demonstrated by the amazing progress in the ?eld of ULSI technology. This progress is well described by the famous “Moore’s law” which states, in its most general form, that all the metrics that describe integrated circuit performance (e. g. , speed, number of devices, chip area) improve expon- tially as a function of time. For example, the number of components per chip d- bles every 18 months and the critical dimension on a chip has shrunk by 50% every 2 years on average in the last 30 years. This rapid growth in integrated circuits te- nology results in highly complex integrated circuits with an increasing number of interconnects on chips and between the chip and its package. The complexity of the interconnect network on chips involves an increasing number of metal lines per interconnect level, more interconnect levels, and at the same time a reduction in the interconnect line critical dimensions.
Author : T. O. Herndon
Publisher :
Page : 520 pages
File Size : 19,22 MB
Release : 1993
Category : Technology & Engineering
ISBN :
Author : G. S. Mathad
Publisher : The Electrochemical Society
Page : 262 pages
File Size : 26,39 MB
Release : 2001
Category : Science
ISBN : 9781566772945
Author : Yoshio Nishi
Publisher : CRC Press
Page : 1720 pages
File Size : 16,51 MB
Release : 2017-12-19
Category : Technology & Engineering
ISBN : 1420017667
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
Author : Electrochemical Society. Dielectric Science and Technology Division
Publisher : The Electrochemical Society
Page : 304 pages
File Size : 50,38 MB
Release : 2001
Category : Science
ISBN : 9781566773133
Author :
Publisher :
Page : 306 pages
File Size : 41,14 MB
Release : 2001
Category : Silicon dioxide
ISBN :