Lithographer 3 & 2
Author : United States. Bureau of Naval Personnel
Publisher :
Page : 520 pages
File Size : 22,57 MB
Release : 1963
Category : Lithography
ISBN :
Author : United States. Bureau of Naval Personnel
Publisher :
Page : 520 pages
File Size : 22,57 MB
Release : 1963
Category : Lithography
ISBN :
Author : United States. Naval Education and Training Command
Publisher :
Page : 668 pages
File Size : 21,64 MB
Release : 1975
Category : Lithography
ISBN :
Author :
Publisher :
Page : 557 pages
File Size : 38,93 MB
Release : 1975
Category : Lithography
ISBN :
Author : United States. Bureau of Naval Personnel
Publisher :
Page : 503 pages
File Size : 30,55 MB
Release : 1963
Category : Lithography
ISBN :
Author : United States. Naval Education and Training Command
Publisher :
Page : 659 pages
File Size : 41,27 MB
Release : 1980
Category : Lithography
ISBN :
Author : David A. Murray
Publisher :
Page : 424 pages
File Size : 38,65 MB
Release : 1981
Category : Lithography
ISBN :
Author :
Publisher :
Page : 557 pages
File Size : 38,42 MB
Release : 1975
Category : Lithography
ISBN :
Author : United States
Publisher :
Page : 1050 pages
File Size : 39,88 MB
Release : 1938
Category : Budget
ISBN :
Author : Wayne M. Moreau
Publisher : Springer Science & Business Media
Page : 937 pages
File Size : 33,1 MB
Release : 2012-12-06
Category : Technology & Engineering
ISBN : 1461308852
Semiconductor lithography is one of the key steps in the manufacturing of integrated silicon-based circuits. In fabricating a semiconductor device such as a transistor, a series of hot processes consisting of vacuum film deposition, oxidations, and dopant implantation are all patterned into microscopic circuits by the wet processes of lithography. Lithography, as adopted by the semiconductor industry, is the process of drawing or printing the pattern of an integrated circuit in a resist material. The pattern is formed and overlayed to a previous circuit layer as many as 30 times in the manufacture of logic and memory devices. With the resist pattern acting as a mask, a permanent device structure is formed by subtractive (removal) etching or by additive deposition of metals or insulators. Each process step in lithography uses inorganic or organic materials to physically transform semiconductors of silicon, insulators of oxides, nitrides, and organic polymers, and metals, into useful electronic devices. All forms of electromagnetic radiation are used in the processing. Lithography is a mUltidisciplinary science of materials, processes, and equipment, interacting to produce three-dimensional structures. Many aspects of chemistry, electrical engineering, materials science, and physics are involved. The purpose of this book is to bring together the work of many scientists and engineers over the last 10 years and focus upon the basic resist materials, the lithographic processes, and the fundamental principles behind each lithographic process.
Author : Vivek Bakshi
Publisher : SPIE Press
Page : 1104 pages
File Size : 34,33 MB
Release : 2006
Category : Art
ISBN : 9780819458452
This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.