Passivation of Metals and Semiconductors, and Properties of Thin Oxide Layers


Book Description

Passivation of Metals and Semiconductors, and Properties of Thin Oxide Layers contains a selection of papers presented at PASSIVITY-9, the 9th International Symposium on the Passivation of Metals and Semiconductors and the Properties of Thin Oxide Layers, which was held in Paris, 27 June - 1 July, 2005. One hundred and twelve peer-reviewed manuscripts have been included. The book covers all the fundamental and applied aspects of passivity and provides a relevant and updated view of the advances and new trends in the field. It is structured in ten sections: • Growth, (Nano)structure and Composition of Passive Films • Passivity of Semiconductors • Electronic Properties of Passive Films • Passivity Issues in Biological Systems • Passivity in High-Temperature Water • Mechanical Properties of Passive Films,• Passivity Issues in Stress Corrosion Cracking and Tribocorrosion • Passivity Breakdown and Localized Corrosion • Modeling and Simulation • Surface Modifications and Inhibitors (for Improved Corrosion Resistance and/or Adhesion)




Passivation of Metals and Semiconductors


Book Description

This comprehensive volume covers practically all aspects concerning the passivity of metallic and semiconductor materials. Recent advances resulting from new materials in new environments, from metals and insulating films in multilayer structures, and from the chemical side of semiconductor technology are presented.







Passivity of Metals and Semiconductors


Book Description

Passivity of Metals and Semiconductors covers the proceedings of the Fifth International Symposium on Passivity, held in Bombannes, France on May30 - June3, 1983. The said symposium is concerned with passivity of metallic materials, localized corrosion, experimental techniques, and classical techniques such as optical techniques and electron spectroscopy. The book is divided into five sections. Section I deals with the concepts involved in the composition-transport phenomena and covers topics such as the transport of oxygen and water in oxide layers; the kinetics of oxidation of silicon; and the oxidation rate laws of metals that form nonstoichiometric oxides. Section II covers related techniques and their specific applications such as study of passivity of iron by in situ methods; optical methods in the study of passive films; and the analysis of multiple layer surface films by modulated reflection spectroscopy. Section III tackles amorphous metals - their passivity, their depassivation and repassivation in localized corrosion, and a comparison of models for localized breakdown of passivity. Part IV discusses the photoelectrochemistry of semiconductors; Part V tackles passivation and localized corrosion of stainless steels. The text is recommended for organic chemists, metallurgists, and engineers who would like to know more about the passivity of metals and their applications in different fields.




Electrochemistry at Metal and Semiconductor Electrodes


Book Description

Electrochemisty at Metal and Semiconductor Electrodes covers the structure of the electrical double layer and charge transfer reactions across the electrode/electrolyte interface. The purpose of the book is to integrate modern electrochemistry and semiconductor physics, thereby, providing a quantitative basis for understanding electrochemistry at metal and semiconductor electrodes. Electrons and ions are the principal particles which play the main role in electrochemistry. This text, therefore, emphasizes the energy level concepts of electrons and ions rather than the phenomenological thermodynamic and kinetic concepts on which most of the classical electrochemistry texts are based. This rationalization of the phenomenological concepts in terms of the physics of semiconductors should enable readers to develop more atomistic and quantitative insights into processes that occur at electrodes. The book incorporates many traditional disciplines of science and engineering such as interfacial chemistry, biochemistry, enzyme chemistry, membrane chemistry, metallurgy, modification of solid interfaces, and materials' corrosion. The text is intended to serve as an introduction for the study of advanced electrochemistry at electrodes and is aimed towards graduates and senior undergraduates studying materials and interfacial chemistry or those beginning research work in the field of electrochemistry.




Metal Impurities in Silicon- and Germanium-Based Technologies


Book Description

This book provides a unique review of various aspects of metallic contamination in Si and Ge-based semiconductors. It discusses all of the important metals including their origin during crystal and/or device manufacturing, their fundamental properties, their characterization techniques and their impact on electrical devices’ performance. Several control and possible gettering approaches are addressed. The book offers a valuable reference guide for all researchers and engineers studying advanced and state-of-the-art micro- and nano-electronic semiconductor devices and circuits. Adopting an interdisciplinary approach, it combines perspectives from e.g. material science, defect engineering, device processing, defect and device characterization, and device physics and engineering.




Testing Tribocorrosion of Passivating Materials Supporting Research and Industrial Innovation


Book Description

This first edition of Testing Tribocorrosion of Passivating Materials Supporting Research and Industrial Innovation: A Handbook treats in a clear, concise, and practical manner an important material degradation and protection matter. It is designed as a handbook and provides a well structured approach of the basics needed to investigate the tribocorrosion behavior of passivating materials, and to conduct in a correct way a laboratory investigation on it. It provides answers on practical and theoretical approaches of tribocorrosion phenomena to engineers and medical persons involved with material assemblies subjected to aggressive environmental and mechanical conditions. For academic researchers it is a pertinent tool assisting them in how they can perform a tribocorrosion investigation and obtain results that are correctly interpreted and can be exchanged. Different parts of the book are illustrated with practical examples. This handbook is truly an indispensable guide for every professional who comes into contact with the complex material degradation and protection processes that take place under combined corrosion and wear conditions. Fields of interest include: transportation (aeronautics, maritime, rail, automotive), medical implants (orthopaedics, dentistry), biochemistry, food production, energy production, and machining. The coordination of this handbook writing was done by Professor Jean-Pierre Celis (Katholieke Universiteit Leuven, Belgium) and Professor Pierre Ponthiaux (Ecole Centrale Paris, France) assisted by twelve European experts who contributed jointly to the nine chapters of this handbook. Main topics dealt with are tribocorrosion phenomena in medical and industrial sectors, depassivation and repassivation phenomena, impact on synergism in tribocorrosion, specific testing techniques, coupling tribology-to-corrosion, design of a testing protocol, and normalisation.




Atomic Layer Deposition for Semiconductors


Book Description

Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.







Metal-semiconductor Interfaces


Book Description