Advances in Rapid Thermal Processing
Author : Fred Roozeboom
Publisher : The Electrochemical Society
Page : 470 pages
File Size : 47,41 MB
Release : 1999
Category : Technology & Engineering
ISBN : 9781566772327
Author : Fred Roozeboom
Publisher : The Electrochemical Society
Page : 470 pages
File Size : 47,41 MB
Release : 1999
Category : Technology & Engineering
ISBN : 9781566772327
Author : Materials Research Society. Meeting
Publisher :
Page : 696 pages
File Size : 37,79 MB
Release : 1996-10-28
Category : Technology & Engineering
ISBN :
Based on an international gathering of scientists and engineers from 17 countries, this book, the fifth in a continuing series, assesses microwave processing of materials as an emerging technology. Significant advances in understanding and control of microwave energy and its use in the processing and testing of materials are outlined. Future research and development needs are also explored. Topics include: scale-up and commercialization; microwave nondestructive testing; microwave processing; microwave system design; dielectric properties measurements and analysis; modelling of microwave heating; microwave interactions and mechanisms; microwave processing using variable frequency sources; alternate microwave sources; remediation of hazardous waste; temperature modelling and measurements; microwave processing of polymers; and plasma processing.
Author : J. C. Gelpey
Publisher :
Page : 416 pages
File Size : 45,84 MB
Release : 1996-10-14
Category : Technology & Engineering
ISBN :
This book is the latest in a continuing series on rapid thermal processing and related topics. It embraces a diversity of research, development and manufacturing activities that require rapid thermal and integrated processing techniques which are recognized by their acronyms, such as rapid thermal annealing (RTA), rapid thermal processing (RTP), rapid thermal chemical vapor deposition (RTCVP), rapid thermal oxidation (RTO), and others. This fifth anniversary volume reports notable advances in the use of rapid thermal techniques in processing science and technology, and for process control in industrial fabrication facilities. It is organized around progress obtained through: evaluation methodology; equipment and process modelling; temperature control; defects and diffusion associated with annealing; metallizations such as silicidation; novel processing of sol-gel and magnetic films; dielectric growth and deposition; and silicon or silicon-germanium film deposition.
Author : Hisham Z. Massoud
Publisher : The Electrochemical Society
Page : 686 pages
File Size : 17,75 MB
Release : 1997
Category : Computers
ISBN : 9781566771306
Author : Walter J. Gray
Publisher :
Page : 1398 pages
File Size : 11,48 MB
Release : 1997-07
Category : Technology & Engineering
ISBN :
This book features scientific research that supports the safe and effective disposal of radioactive waste in a geological repository. One highlight of the volume is the opening talk by Rustum Roy, who was instrumental in establishing the first symposium on this topic in 1978. Professor Roy summarizes his views of the past 19 years of progress in the field. A second highlight is the participation by several Russian and Ukrainian scientists who authored papers on nuclear waste disposal aspects of the Chernobyl Unit 4 reactor that exploded in April 1986. Additional topics include: glass formulations and properties; glass/water interactions; cements in radioactive waste management; ceramic and crystalline waste forms; spent nuclear fuel; waste processing and treatment; radiation effects in ceramics, glasses and nuclear waste materials; waste package materials; radionuclide solubility and speciation; radionuclide sorption; radionuclide transport; repository backfill; performance assessment; natural analogues and excess plutonium dispositioning.
Author : Yue Kuo
Publisher : The Electrochemical Society
Page : 324 pages
File Size : 38,39 MB
Release : 2003
Category : Thin film transistors
ISBN : 9781566773850
Author : Clyde L. Briant
Publisher :
Page : 546 pages
File Size : 22,32 MB
Release : 1997-07-08
Category : Science
ISBN :
The study of interfaces is one of the oldest areas of research in materials science. The presence of grain boundaries in materials has long been recognized, as has its crucial role in determining mechanical properties. Another long-recognized concept is that the properties of a surface are quite different from those of the bulk. In recent years, researchers have been able to study these interfaces, both internal and external, with a detail not before possible. These advances have stemmed from the ability to obtain atomic resolution images of interfaces, to measure accurate chemical compositions of interfaces, and to model these interfaces and their properties. This volume goes a step further, beyond structural and chemical studies, to explore how all of this information can be used to engineer interfaces for improved properties and overall improved material performance. Significant attention is given to the crystallographic nature of grain boundaries and interfaces, and the relationship between this nature and the performance of a material. The versatility of electron back-scattering pattern analysis (EBSP) in solving a number of interface-related problems is also featured.
Author : Fred Roozeboom
Publisher : The Electrochemical Society
Page : 482 pages
File Size : 15,85 MB
Release : 2000
Category : Technology & Engineering
ISBN : 9781566772747
The proceedings from this May 2000 symposium illustrate the range of applications in Rapid Thermal Processing (RTP). The refereed papers cover a variety of issues, such as ultra-shallow junctions; contacts for nanoscale CMOS; gate stacks; new applications of RTP, such as for the enhanced crystalization of amorphous silicon thin films; and advances on RTP systems and process monitoring, including optimizing and controlling gas flows in an RTCVD reactor. Most presentations are supported by charts and other graphical data. c. Book News Inc.
Author : Andrew David Oliver
Publisher :
Page : 448 pages
File Size : 38,75 MB
Release : 1997
Category :
ISBN :
Author : Yoshio Nishi
Publisher : CRC Press
Page : 1186 pages
File Size : 27,70 MB
Release : 2000-08-09
Category : Technology & Engineering
ISBN : 9780824787837
The Handbook of Semiconductor Manufacturing Technology describes the individual processes and manufacturing control, support, and infrastructure technologies of silicon-based integrated-circuit manufacturing, many of which are also applicable for building devices on other semiconductor substrates. Discussing ion implantation, rapid thermal processing, photomask fabrication, chip testing, and plasma etching, the editors explore current and anticipated equipment, devices, materials, and practices of silicon-based manufacturing. The book includes a foreword by Jack S. Kilby, cowinner of the Nobel Prize in Physics 2000 "for his part in the invention of the integrated circuit."