Silicon VLSI Technology
Author : James D. Plummer
Publisher : Pearson Education India
Page : 836 pages
File Size : 28,61 MB
Release : 2009
Category : Integrated circuits
ISBN : 9788131726044
Author : James D. Plummer
Publisher : Pearson Education India
Page : 836 pages
File Size : 28,61 MB
Release : 2009
Category : Integrated circuits
ISBN : 9788131726044
Author : J.-P. Colinge
Publisher : Springer Science & Business Media
Page : 392 pages
File Size : 48,21 MB
Release : 2004-02-29
Category : Science
ISBN : 9781402077739
Silicon-on-Insulator Technology: Materials to VLSI, Third Edition, retraces the evolution of SOI materials, devices and circuits over a period of roughly twenty years. Twenty years of progress, research and development during which SOI material fabrication techniques have been born and abandoned, devices have been invented and forgotten, but, most importantly, twenty years during which SOI Technology has little by little proven it could outperform bulk silicon in every possible way. The turn of the century turned out to be a milestone for the semiconductor industry, as high-quality SOI wafers suddenly became available in large quantities. From then on, it took only a few years to witness the use of SOI technology in a wealth of applications ranging from audio amplifiers and wristwatches to 64-bit microprocessors. This book presents a complete and state-of-the-art review of SOI materials, devices and circuits. SOI fabrication and characterization techniques, SOI CMOS processing, and the physics of the SOI MOSFET receive an in-depth analysis. Silicon-on-Insulator Technology: Materials to VLSI, Third Edition, also describes the properties of other SOI devices, such as multiple gate MOSFETs, dynamic threshold devices and power MOSFETs. The advantages and performance of SOI circuits used in both niche and mainstream applications are discussed in detail. The SOI specialist will find this book invaluable as a source of compiled references covering the different aspects of SOI technology. For the non-specialist, the book serves an excellent introduction to the topic with detailed, yet simple and clear explanations. Silicon-on-Insulator Technology: Materials to VLSI, Third Edition is recommended for use as a textbook for classes on semiconductor device processing and physics at the graduate level.
Author : Wayne Wolf
Publisher : Pearson Education
Page : 703 pages
File Size : 44,54 MB
Release : 2002-01-14
Category : Technology & Engineering
ISBN : 0132441845
For Electrical Engineering and Computer Engineering courses that cover the design and technology of very large scale integrated (VLSI) circuits and systems. May also be used as a VLSI reference for professional VLSI design engineers, VLSI design managers, and VLSI CAD engineers. Modern VSLI Design provides a comprehensive “bottom-up” guide to the design of VSLI systems, from the physical design of circuits through system architecture with focus on the latest solution for system-on-chip (SOC) design. Because VSLI system designers face a variety of challenges that include high performance, interconnect delays, low power, low cost, and fast design turnaround time, successful designers must understand the entire design process. The Third Edition also provides a much more thorough discussion of hardware description languages, with introduction to both Verilog and VHDL. For that reason, this book presents the entire VSLI design process in a single volume.
Author : Stanley Wolf
Publisher :
Page : 0 pages
File Size : 12,74 MB
Release : 2002
Category : Integrated circuits
ISBN :
Author : Fumio Shimura
Publisher : Elsevier
Page : 435 pages
File Size : 30,6 MB
Release : 2012-12-02
Category : Technology & Engineering
ISBN : 0323150489
Semiconductor Silicon Crystal Technology provides information pertinent to silicon, which is the dominant material in the semiconductor industry. This book discusses the technology of integrated circuits (ICs) in electronic materials manufacturer. Comprised of eight chapters, this book provides an overview of the basic science, silicon materials, IC device fabrication processes, and their interaction for enhancing both the processes and materials. This text then proceeds with a discussion of the atomic structure and bonding mechanisms in order to understand the nature and formation of crystal structures, which are the fundamentals of material science. Other chapters consider the technological crystallography and classify natural crystal morphologies based on observation. The final chapter deals with the interrelationships among silicon material characteristics, circuit design, and IC fabrication in order to ensure the fabrication of very-large-scale-integration/ultra-large-scale-integration circuits. This book is a valuable resource for graduate students, physicists, engineers, materials scientists, and professionals involved in semiconductor industry.
Author : Golla Eranna
Publisher : CRC Press
Page : 432 pages
File Size : 48,78 MB
Release : 2014-12-08
Category : Science
ISBN : 1482232812
Silicon, as a single-crystal semiconductor, has sparked a revolution in the field of electronics and touched nearly every field of science and technology. Though available abundantly as silica and in various other forms in nature, silicon is difficult to separate from its chemical compounds because of its reactivity. As a solid, silicon is chemically inert and stable, but growing it as a single crystal creates many technological challenges. Crystal Growth and Evaluation of Silicon for VLSI and ULSI is one of the first books to cover the systematic growth of silicon single crystals and the complete evaluation of silicon, from sand to useful wafers for device fabrication. Written for engineers and researchers working in semiconductor fabrication industries, this practical text: Describes different techniques used to grow silicon single crystals Explains how grown single-crystal ingots become a complete silicon wafer for integrated-circuit fabrication Reviews different methods to evaluate silicon wafers to determine suitability for device applications Analyzes silicon wafers in terms of resistivity and impurity concentration mapping Examines the effect of intentional and unintentional impurities Explores the defects found in regular silicon-crystal lattice Discusses silicon wafer preparation for VLSI and ULSI processing Crystal Growth and Evaluation of Silicon for VLSI and ULSI is an essential reference for different approaches to the selection of the basic silicon-containing compound, separation of silicon as metallurgical-grade pure silicon, subsequent purification, single-crystal growth, and defects and evaluation of the deviations within the grown crystals.
Author : Sorab Khushro Ghandhi
Publisher : John Wiley & Sons
Page : 690 pages
File Size : 31,24 MB
Release : 1983
Category : Science
ISBN :
Fully updated with the latest technologies, this edition covers the fundamental principles underlying fabrication processes for semiconductor devices along with integrated circuits made from silicon and gallium arsenide. Stresses fabrication criteria for such circuits as CMOS, bipolar, MOS, FET, etc. These diverse technologies are introduced separately and then consolidated into complete circuits. An Instructor's Manual presenting detailed solutions to all the problems in the book is available from the Wiley editorial department.
Author : Yuan Taur
Publisher : Cambridge University Press
Page : 0 pages
File Size : 15,36 MB
Release : 2013-05-02
Category : Technology & Engineering
ISBN : 9781107635715
Learn the basic properties and designs of modern VLSI devices, as well as the factors affecting performance, with this thoroughly updated second edition. The first edition has been widely adopted as a standard textbook in microelectronics in many major US universities and worldwide. The internationally renowned authors highlight the intricate interdependencies and subtle trade-offs between various practically important device parameters, and provide an in-depth discussion of device scaling and scaling limits of CMOS and bipolar devices. Equations and parameters provided are checked continuously against the reality of silicon data, making the book equally useful in practical transistor design and in the classroom. Every chapter has been updated to include the latest developments, such as MOSFET scale length theory, high-field transport model and SiGe-base bipolar devices.
Author : O. Kononchuk
Publisher : Elsevier
Page : 503 pages
File Size : 44,42 MB
Release : 2014-06-19
Category : Technology & Engineering
ISBN : 0857099256
Silicon-On-Insulator (SOI) Technology: Manufacture and Applications covers SOI transistors and circuits, manufacture, and reliability. The book also looks at applications such as memory, power devices, and photonics. The book is divided into two parts; part one covers SOI materials and manufacture, while part two covers SOI devices and applications. The book begins with chapters that introduce techniques for manufacturing SOI wafer technology, the electrical properties of advanced SOI materials, and modeling short-channel SOI semiconductor transistors. Both partially depleted and fully depleted SOI technologies are considered. Chapters 6 and 7 concern junctionless and fin-on-oxide field effect transistors. The challenges of variability and electrostatic discharge in CMOS devices are also addressed. Part two covers recent and established technologies. These include SOI transistors for radio frequency applications, SOI CMOS circuits for ultralow-power applications, and improving device performance by using 3D integration of SOI integrated circuits. Finally, chapters 13 and 14 consider SOI technology for photonic integrated circuits and for micro-electromechanical systems and nano-electromechanical sensors. The extensive coverage provided by Silicon-On-Insulator (SOI) Technology makes the book a central resource for those working in the semiconductor industry, for circuit design engineers, and for academics. It is also important for electrical engineers in the automotive and consumer electronics sectors. - Covers SOI transistors and circuits, as well as manufacturing processes and reliability - Looks at applications such as memory, power devices, and photonics
Author : John Michael Williams
Publisher : Springer
Page : 557 pages
File Size : 31,96 MB
Release : 2014-06-17
Category : Technology & Engineering
ISBN : 3319047892
This book is structured as a step-by-step course of study along the lines of a VLSI integrated circuit design project. The entire Verilog language is presented, from the basics to everything necessary for synthesis of an entire 70,000 transistor, full-duplex serializer-deserializer, including synthesizable PLLs. The author includes everything an engineer needs for in-depth understanding of the Verilog language: Syntax, synthesis semantics, simulation and test. Complete solutions for the 27 labs are provided in the downloadable files that accompany the book. For readers with access to appropriate electronic design tools, all solutions can be developed, simulated, and synthesized as described in the book. A partial list of design topics includes design partitioning, hierarchy decomposition, safe coding styles, back annotation, wrapper modules, concurrency, race conditions, assertion-based verification, clock synchronization, and design for test. A concluding presentation of special topics includes System Verilog and Verilog-AMS.