Author : Ian G. Brown
Publisher : John Wiley & Sons
Page : 408 pages
File Size : 39,43 MB
Release : 2004-10-15
Category : Science
ISBN : 9783527404100
Das bekannte Handbuch der Ionenquellen - jetzt in neuer, aktualisierter Auflage! Neben den Grundlagen (Plasmaphysik, Strahltransport, computergestützte Modellierung) wird eine Vielzahl von Ionenquellen für spezielle Anwendungen detailreich vorgestellt. Ein praxistaugliches Nachschlagewerk für Plasmaphysiker und alle, die Ionenquellen für analytische Zwecke nutzen.
Author : Ian G. Brown
Publisher : John Wiley & Sons
Page : 396 pages
File Size : 38,88 MB
Release : 2006-03-06
Category : Science
ISBN : 3527604545
The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.
Author : Bernhard Wolf
Publisher : CRC Press
Page : 560 pages
File Size : 31,28 MB
Release : 2017-07-12
Category : Technology & Engineering
ISBN : 1351838385
The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.
Author : Viacheslav V. Zhurin
Publisher : John Wiley & Sons
Page : 326 pages
File Size : 47,26 MB
Release : 2012-09-19
Category : Science
ISBN : 3527635742
Due to the large number of uses of ion sources in academia and industry, those who utilize these sources need up to date and coherent information to keep themselves abreast of developments and options, and to chose ideal solutions for quality and cost-effectiveness. This book, written by an author with a strong industrial background and excellent standing, is the comprehensive guide users and developers of ion sources have been waiting for. Providing a thorough refresher on the physics involved, this resource systematically covers the source types, components, and the operational parameters.
Author : Jon Orloff
Publisher : Springer Science & Business Media
Page : 304 pages
File Size : 28,8 MB
Release : 2012-12-06
Category : Technology & Engineering
ISBN : 1461507650
In this book, we have attempted to produce a reference on high resolution focused ion beams (FIBs) that will be useful for both the user and the designer of FIB instrumentation. We have included a mix of theory and applications that seemed most useful to us. The field of FIBs has advanced rapidly since the application of the first field emission ion sources in the early 1970s. The development of the liquid metal ion source (LMIS) in the late 1960s and early 1970s and its application for FIBs in the late 1970s have resulted in a powerful tool for research and for industry. There have been hundreds of papers written on many aspects of LMIS and FIBs, and a useful and informative book on these subjects was published in 1991 by Phil Prewett and Grame Mair. Because there have been so many new applications and uses found for FIBs in the last ten years we felt that it was time for another book on the subject.
Author : M. D. Gabovich
Publisher :
Page : 334 pages
File Size : 25,8 MB
Release : 1973
Category :
ISBN :
;Contents: Brief information on certain elemental processes occurring in plasma ion sources; Plasma ion sources (basic physical processes, designs, properties, and parameters); The mass spectrum and charge composition of beams extracted from plasma ion sources; Plasma sources of ions of refractory metals; Extraction of ions and the primary formation of ion beams. Beam propagation and a study of beams; Penetration of a plasma from an ion source into a vacuum. Energy of the ions leaving the source plasma; The vibrational properties of a plasma and their influence on the processes in plasma ion sources and neutralized ion beams.
Author : Vadim Dudnikov
Publisher : Springer Nature
Page : 346 pages
File Size : 17,54 MB
Release : 2019-10-18
Category : Science
ISBN : 3030284379
This book describes the development of sources of negative ions and their application in science and industry. It describes the physical foundations and implementation of the key methods of negative ion production and control, such as charge exchange, thermionic emission, secondary emission (sputtering) and surface-plasma sources, as well as the history of their development. Following on from this essential foundational material, the book goes on to explore transport of negative ion beams, and beam-plasma instabilities. With exposition accessible at the graduate level, and a comprehensive bibliography, this book will appeal to all students and researchers whose work concerns ion sources and their applications to accelerators, beam physics, storage rings, cyclotrons, and plasma traps.
Author : R Geller
Publisher : CRC Press
Page : 456 pages
File Size : 37,64 MB
Release : 1996-01-01
Category : Science
ISBN : 9780750301077
Acknowledged as the "founding father" of and world renowned expert on electron cyclotron resonance sources Richard Geller has produced a unique book devoted to the physics and technicalities of electron cyclotron resonance sources. Electron Cyclotron Resonance Ion Sources and ECR Plasmas provides a primer on electron cyclotron phenomena in ion sources as well as being a reference to the field of ion source developments. Coverage includes elements of plasma physics, specific electron cyclotron resonance physics, and the relevant technology directed at both scientists and engineers.
Author : F.J. Currell
Publisher : Springer Science & Business Media
Page : 434 pages
File Size : 38,63 MB
Release : 2003-09-30
Category : Medical
ISBN : 9781402015656
This book is the first in a series of two volumes providing an introduction and comprehensive review of the physics of highly charged ions. Dealing with sources, applications and fundamental processes, it covers a wide range of topics varying from cancer therapy to tests of quantum electrodynamics. Fusion related processes and those pertaining to astrophysics receive comprehensive coverage as well as theoretical and experimental treatments of the fundamental processes in which highly charged ions can become involved. All of these subjects are covered and the newest findings are reviewed.
Author : M.D. Gabovich
Publisher : Springer
Page : 260 pages
File Size : 43,34 MB
Release : 1989-01-31
Category : Science
ISBN :
Translated from the Russian. Studies the physical and technical fundamentals of modern ion sources, sputtering processes, ion implantation, and atomic beams to present their current and future technological applications. No index. Annotation copyrighted by Book News, Inc., Portland, OR
