2015 IEEE International Reliability Physics Symposium (IRPS 2015)
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Page : pages
File Size : 17,94 MB
Release : 2015
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Author :
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Page : pages
File Size : 17,94 MB
Release : 2015
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Author :
Publisher :
Page : pages
File Size : 36,50 MB
Release : 2015
Category : Electronic apparatus and appliances
ISBN : 9781467373623
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Page : pages
File Size : 41,46 MB
Release : 2015
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Author : International Reliability Physics Symposium
Publisher :
Page : 766 pages
File Size : 12,77 MB
Release : 2004
Category : Electronic apparatus and appliances
ISBN :
Author : IEEE Staff
Publisher :
Page : pages
File Size : 42,98 MB
Release : 2017-04-02
Category :
ISBN : 9781509066421
Study of reliability as applied to semiconductor manufacturing, automotive, PV, and other engineering disciplines International participation
Author : Marco Ottavi
Publisher : Springer
Page : 294 pages
File Size : 15,66 MB
Release : 2017-08-28
Category : Technology & Engineering
ISBN : 3319544225
This book provides comprehensive coverage of the dependability challenges in today's advanced computing systems. It is an in-depth discussion of all the technological and design-level techniques that may be used to overcome these issues and analyzes various dependability-assessment methods. The impact of individual application scenarios on the definition of challenges and solutions is considered so that the designer can clearly assess the problems and adjust the solution based on the specifications in question. The book is composed of three sections, beginning with an introduction to current dependability challenges arising in complex computing systems implemented with nanoscale technologies, and of the effect of the application scenario. The second section details all the fault-tolerance techniques that are applicable in the manufacture of reliable advanced computing devices. Different levels, from technology-level fault avoidance to the use of error correcting codes and system-level checkpointing are introduced and explained as applicable to the different application scenario requirements. Finally the third section proposes a roadmap of future trends in and perspectives on the dependability and manufacturability of advanced computing systems from the special point of view of industrial stakeholders. Dependable Multicore Architectures at Nanoscale showcases the original ideas and concepts introduced into the field of nanoscale manufacturing and systems reliability over nearly four years of work within COST Action IC1103 MEDIAN, a think-tank with participants from 27 countries. Academic researchers and graduate students working in multi-core computer systems and their manufacture will find this book of interest as will industrial design and manufacturing engineers working in VLSI companies.
Author : IEEE
Publisher : Institute of Electrical & Electronics Engineers(IEEE)
Page : pages
File Size : 41,74 MB
Release : 2000-10
Category : Science
ISBN : 9780780358638
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Page : pages
File Size : 38,3 MB
Release : 1977
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Author : Sheldon Tan
Publisher : Springer Nature
Page : 460 pages
File Size : 49,52 MB
Release : 2019-09-12
Category : Technology & Engineering
ISBN : 3030261727
This book provides readers with a detailed reference regarding two of the most important long-term reliability and aging effects on nanometer integrated systems, electromigrations (EM) for interconnect and biased temperature instability (BTI) for CMOS devices. The authors discuss in detail recent developments in the modeling, analysis and optimization of the reliability effects from EM and BTI induced failures at the circuit, architecture and system levels of abstraction. Readers will benefit from a focus on topics such as recently developed, physics-based EM modeling, EM modeling for multi-segment wires, new EM-aware power grid analysis, and system level EM-induced reliability optimization and management techniques. Reviews classic Electromigration (EM) models, as well as existing EM failure models and discusses the limitations of those models; Introduces a dynamic EM model to address transient stress evolution, in which wires are stressed under time-varying current flows, and the EM recovery effects. Also includes new, parameterized equivalent DC current based EM models to address the recovery and transient effects; Presents a cross-layer approach to transistor aging modeling, analysis and mitigation, spanning multiple abstraction levels; Equips readers for EM-induced dynamic reliability management and energy or lifetime optimization techniques, for many-core dark silicon microprocessors, embedded systems, lower power many-core processors and datacenters.
Author :
Publisher :
Page : pages
File Size : 36,70 MB
Release : 2016
Category : Electronic apparatus and appliances
ISBN : 9781467391368