Handbook of Thin Film Deposition


Book Description

Handbook of Thin Film Deposition, Fifth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry. When pursuing patents, there is a phase called 'reduction to practice' where the idea for a technology transitions from a concept to actual use. The section 'Thin Film Reduction to Practice' includes chapters that review the most relevant methods to fabricate thin films towards practical applications. Then, the latest applications of thin film deposition technologies are discussed. Handbook of Thin Film Deposition, 5th Edition is suitable for materials scientists and engineers in academia and working in semiconductor R&D. - Offers a practical survey of thin film technologies including design, fabrication, and reliability - Covers core processes and applications in the semiconductor industry and discusses latest advances in new thin film development - Features new chapters that review methods on front-end and back-end thin films




Direct Copper Interconnection for Advanced Semiconductor Technology


Book Description

In the “More than Moore” era, performance requirements for leading edge semiconductor devices are demanding extremely fine pitch interconnection in semiconductor packaging. Direct copper interconnection has emerged as the technology of choice in the semiconductor industry for fine pitch interconnection, with significant benefits for interconnect density and device performance. Low-temperature direct copper bonding, in particular, will become widely adopted for a broad range of highperformance semiconductor devices in the years to come. This book offers a comprehensive review and in-depth discussions of the key topics in this critical new technology. Chapter 1 reviews the evolution and the most recent advances in semiconductor packaging, leading to the requirement for extremely fine pitch interconnection, and Chapter 2 reviews different technologies for direct copper interconnection, with advantages and disadvantages for various applications. Chapter 3 offers an in-depth review of the hybrid bonding technology, outlining the critical processes and solutions. The area of materials for hybrid bonding is covered in Chapter 4, followed by several chapters that are focused on critical process steps and equipment for copper electrodeposition (Chapter 5), planarization (Chapter 6), wafer bonding (Chapter 7), and die bonding (Chapter 8). Aspects related to product applications are covered in Chapter 9 for design and Chapter 10 for thermal simulation. Finally, Chapter 11 covers reliability considerations and computer modeling for process and performance characterization, followed by the final chapter (Chapter 12) outlining the current and future applications of the hybrid bonding technology. Metrology and testing are also addressed throughout the chapters. Business, economic, and supply chain considerations are discussed as related to the product applications and manufacturing deployment of the technology, and the current status and future outlook as related to the various aspects of the ecosystem are outlined in the relevant chapters of the book. The book is aimed at academic and industry researchers as well as industry practitioners, and is intended to serve as a comprehensive source of the most up-to-date knowledge, and a review of the state-of-the art of the technology and applications, for direct copper interconnection and advanced semiconductor packaging in general.







2021 IEEE International Interconnect Technology Conference (IITC)


Book Description

IITC is sponsored by the IEEE Electron Devices Society as the premier conference for interconnect technology devoted to leading edge research in the field of advanced metallization and 3D integration for ULSI IC applications The conference includes papers on all aspects of BEOL MOL interconnects and metallization, including design, unit process, integration and reliability




Nano-Interconnect Materials and Models for Next Generation Integrated Circuit Design


Book Description

Aggressive scaling of device and interconnect dimensions has resulted in many low dimensional issues in the nanometer regime. This book deals with various new generation interconnect materials and interconnect modeling and highlights the significance of novel nano interconnect materials for 3D integrated circuit design. It provides information about advanced nanomaterials like carbon nanotube (CNT) and graphene nanoribbon (GNR) for the realization of interconnects, interconnect models, and crosstalk noise analysis. Features: Focusses on materials and nanomaterials utilization in next generation interconnects based on Carbon nanotubes (CNT) and Graphene nanoribbons (GNR). Helps readers realize interconnects, interconnect models, and crosstalk noise analysis. Describes Hybrid CNT and GNR based interconnects. Presents the details of power supply voltage drop analysis in CNT and GNR interconnects. Overviews pertinent RF performance and stability analysis. This book is aimed at graduate students and researchers in electrical and materials engineering, nano/microelectronics.




2020 IEEE International Interconnect Technology Conference (IITC)


Book Description

IITC is sponsored by the IEEE Electron Devices Society as the premier conference for interconnect technology devoted of advanced metallization and 3D integration for ULSI IC applications Starting as a workshop on refractory metals and silicides in the 1980 s and moving towards advanced metallization in 1995, the 28th edition of MAM is devoted to research on materials properties and interactions of interconnect and silicide materials




Embedded Artificial Intelligence


Book Description

Recent technological developments in sensors, edge computing, connectivity, and artificial intelligence (AI) technologies have accelerated the integration of data analysis based on embedded AI capabilities into resource-constrained, energy-efficient hardware devices for processing information at the network edge. Embedded AI combines embedded machine learning (ML) and deep learning (DL) based on neural networks (NN) architectures such as convolutional NN (CNN), or spiking neural network (SNN) and algorithms on edge devices and implements edge computing capabilities that enable data processing and analysis without optimised connectivity and integration, allowing users to access data from various sources. Embedded AI efficiently implements edge computing and AI processes on resource-constrained devices to mitigate downtime and service latency, and it successfully merges AI processes as a pivotal component in edge computing and embedded system devices. Embedded AI also enables users to reduce costs, communication, and processing time by assembling data and by supporting user requirements without the need for continuous interaction with physical locations. This book provides an overview of the latest research results and activities in industrial embedded AI technologies and applications, based on close cooperation between three large-scale ECSEL JU projects, AI4DI, ANDANTE, and TEMPO. The book’s content targets researchers, designers, developers, academics, post-graduate students and practitioners seeking recent research on embedded AI. It combines the latest developments in embedded AI, addressing methodologies, tools, and techniques to offer insight into technological trends and their use across different industries.




Nanometer CMOS ICs


Book Description







Advances in Chemical Mechanical Planarization (CMP)


Book Description

Advances in Chemical Mechanical Planarization (CMP), Second Edition provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The second edition includes the recent advances of CMP and its emerging materials, methods, and applications, including coverage of post-CMP cleaning challenges and tribology of CMP. This important book offers a systematic review of fundamentals and advances in the area. Part one covers CMP of dielectric and metal films, with chapters focusing on the use of current and emerging techniques and processes and on CMP of various materials, including ultra low-k materials and high-mobility channel materials, and ending with a chapter reviewing the environmental impacts of CMP processes. New content addressed includes CMP challenges with tungsten, cobalt, and ruthenium as interconnect and barrier films, consumables for ultralow topography and CMP for memory devices. Part two addresses consumables and process control for improved CMP and includes chapters on CMP pads, diamond disc pad conditioning, the use of FTIR spectroscopy for characterization of surface processes and approaches for defection characterization, mitigation, and reduction. Advances in Chemical Mechanical Planarization (CMP), Second Edition is an invaluable resource and key reference for materials scientists and engineers in academia and R&D. - Reviews the most relevant techniques and processes for CMP of dielectric and metal films - Includes chapters devoted to CMP for current and emerging materials - Addresses consumables and process control for improved CMP, including post-CMP