Author : Avishay Katz
Publisher :
Page : 1000 pages
File Size : 45,97 MB
Release : 1992-10-28
Category : Technology & Engineering
ISBN :
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author : Avishay Katz
Publisher : Cambridge University Press
Page : 988 pages
File Size : 47,32 MB
Release : 2014-06-05
Category : Technology & Engineering
ISBN : 9781107409705
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author : S. N. G. Chu
Publisher : The Electrochemical Society
Page : 324 pages
File Size : 21,66 MB
Release : 1995
Category : Technology & Engineering
ISBN : 9781566770934
Author : Jacob Zabicky
Publisher : John Wiley & Sons
Page : 1250 pages
File Size : 10,26 MB
Release : 2009-05-06
Category : Science
ISBN : 9780470743416
Metal Enolates form a class of compounds that have recently received much study because of their part in the important C-C-bond forming aldol reaction. Focusing on this important class of compounds in organic synthesis, The Chemistry of Metal Enolates features contributions on all aspects of Metal Enolate chemistry from the world?s leading experts. Delivering the exceptional quality that?s expected from the Patai Series, this text is essential reading for organic chemists.
Author : Geraldine Cogin Shwartz
Publisher : CRC Press
Page : 598 pages
File Size : 10,90 MB
Release : 1997-11-24
Category : Technology & Engineering
ISBN : 9780849384660
Covering materials, processes, equipment, methodologies, characterization techniques, clean room practices, and ways to control contamination-related defects, this work offers up-to-date information on the application of interconnection technology to semiconductors. It offers an integration of technical, patent and industry literature.
Author : Toivo T. Kodas
Publisher : John Wiley & Sons
Page : 562 pages
File Size : 32,86 MB
Release : 2008-09-26
Category : Technology & Engineering
ISBN : 3527615849
High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.
Author : J Pimbley
Publisher : Elsevier
Page : 305 pages
File Size : 26,49 MB
Release : 2012-12-02
Category : Technology & Engineering
ISBN : 0323156800
Advanced CMOS Process Technology is part of the VLSI Electronics Microstructure Science series. The main topic of this book is complementary metal-oxide semiconductor or CMOS technology, which plays a significant part in the electronics systems. The topics covered in this book range from metallization, isolation techniques, reliability, and yield. The volume begins with an introductory chapter that discusses the microelectronics revolution of the 20th century. Then Chapter 2 puts focus on the CMOS devices and circuit background, discussing CMOS capacitors and field effect transistors. Metallization topics and concepts are covered in Chapter 3, while isolation techniques are tackled in Chapter 4. Long-term reliability of CMOS is the topic covered in Chapter 5. Finally, the ability of semiconductor technology to yield circuits is discussed in Chapter 6. The book is particularly addressed to engineers, scientists, and technical managers.
Author :
Publisher :
Page : 606 pages
File Size : 34,22 MB
Release : 1993
Category : Metallurgy
ISBN :
Author : A.A. Jaecklin
Publisher : Springer Science & Business Media
Page : 401 pages
File Size : 14,59 MB
Release : 2012-12-06
Category : Science
ISBN : 1461533228
This symposium was the sCientific-technical event of the centennial celebration of the Asea Brown Boveri Switzerland. The purpose was to assess the present state of the art as well as shaping the basis for future progress in the area of power devices and related power circuits. The merger of Brown Boveri (BBC) with Asea to Asea Brown Boveri (ABB) three years ago gave new stimulus and enriched the technical substance of the symposium. By 1991, 100 years after the formation of BBC in Switzerland as a single company, this organization has been decentralized, forming 35 independent ABB companies. One of them - ABB Semiconductors Ltd. - directly deals with the power semiconductor business. These significant changes reflect the changes in the market place: increased competition and higher customer expectations have to be fulfilled. In line with the core business activities of ABB and with the concept of sustainable development, it is natural for ABB to be active in the area of power devices and circuits. Increased awareness towards energy conservation is one of the main drives for these activities. User friendliness is another drive: integration of intelligent functions, e.g. protection and/or increased direct computer interfacing of the power circuits. Therefore, also the R&D activities related to the subject of thIs symposium will in the future be characterized by an even stronger coupling with the market needs. For the members of the R&D Laboratories this means improved customer partnership beyond operational excellence.
Author : O. Auciello
Publisher : Springer Science & Business Media
Page : 625 pages
File Size : 35,67 MB
Release : 2012-12-06
Category : Technology & Engineering
ISBN : 9401117276
The synthesis of multicomponent/multilayered superconducting, conducting, semiconducting and insulating thin films has become the subject of an intensive, worldwide, interdisciplinary research effort. The development of deposition-characterization techniques and the science and technology related to the synthesis of these films are critical for the successful evolution of this interdisciplinary field of research and the implementation of the new materials in a whole new generation of advanced microdevices. This book contains the lectures and contributed papers on various scientific and technological aspects of multicomponent and multilayered thin films presented at a NATO/ASI. Compared to other recent books on thin films, the distinctive character of this book is the interdisciplinary treatment of the various fields of research related to the different thin film materials mentioned above. The wide range of topics discussed in this book include vacuum-deposition techniques, synthesis-processing, characterization, and devices of multicomponent/multilayered oxide high temperature superconducting, ferroelectric, electro-optic, optical, metallic, silicide, and compound semiconductor thin films. The book presents an unusual intedisciplinary exchange of ideas between researchers with cross-disciplinary backgrounds and it will be useful to established investigators as well as postdoctoral and graduate students.
