Beam Technologies for Integrated Processing


Book Description

Beam technologies play an important role in microelectronic component fabrication and offer opportunities for application in other manufacturing schemes. Emerging beam technologies that incorporate potential for sensors, control, and information processing have created new opportunities for integrated processing of materials and components. This volume identifies various beam technologies and their applications in electronics and other potential manufacturing processes. Recommendations for research and development to enhance the understanding, capabilities, and applications of beam technologies are presented.




Electron Beam Pasteurization and Complementary Food Processing Technologies


Book Description

Food safety is a constant challenge for the food industry, and food irradiation technology has developed significantly since its introduction, moving from isotope irradiation to the use of electron beam technology. Electron Beam Pasteurization and Complementary Food Processing Technologies explores the application of electron beam pasteurization in conjunction with other food processing technologies to improve the safety and quality of food. Part one provides an overview of the issues surrounding electron beam pasteurization in food processing. Part two looks at different thermal and non-thermal food processing technologies that complement irradiation. Finally, a case study section on the commercial applications of e-beam processing provides examples from industry.




Unit Manufacturing Processes


Book Description

Manufacturing, reduced to its simplest form, involves the sequencing of product forms through a number of different processes. Each individual step, known as an unit manufacturing process, can be viewed as the fundamental building block of a nation's manufacturing capability. A committee of the National Research Council has prepared a report to help define national priorities for research in unit processes. It contains an organizing framework for unit process families, criteria for determining the criticality of a process or manufacturing technology, examples of research opportunities, and a prioritized list of enabling technologies that can lead to the manufacture of products of superior quality at competitive costs. The study was performed under the sponsorship of the National Science Foundation and the Defense Department's Manufacturing Technology Program.




Layout Techniques for Integrated Circuit Designers


Book Description

This book provides complete step-by-step guidance on the physical implementation of modern integrated circuits, showing you their limitations and guiding you through their common remedies. The book describes today’s manufacturing techniques and how they impact design rules. You will understand how to build common high frequency devices such as inductors, capacitors and T-coils, and will also learn strategies for dealing with high-speed routing both on package level and on-chip applications. Numerous algorithms implemented in Python are provided to guide you through how extraction, netlist comparison and design rule checkers can be built. The book also helps you unravel complexities that effect circuit design, including signal integrity, matching, IR drop, parasitic impedance and more, saving you time in addressing these effects directly. You will also find detailed descriptions of software tools used to analyze a layout database, showing you how devices can be recognized and connectivity accurately assessed. The book removes much of fog that often hides the inner workings of layout related software tools and helps you better understand: the physics of advanced nodes, high speed techniques used in modern integrated technologies, and the inner working of software used to analyze layout databases. This is an excellent resource for circuit designers implementing a schematic in a layout database, especially those involved in deep submicron designs, as well as layout designers wishing to deepen their understanding of modern layout rules.







Integrated Processing Technologies for Food and Agricultural By-Products


Book Description

Feeding our globally expanding population is one of the most critical challenges of our time and improving food and agricultural production efficiencies is a key factor in solving this problem. Currently, one-third of food produced for humans is wasted, and for every pound of food produced, roughly an equal amount of nonfood by-product is also generated, creating a significant environmental impact. In Integrated Processing Technologies for Food and Agricultural By-Products experts from around the world present latest developments, recognizing that while some by-products have found use as animal feed or are combusted for energy, new technologies which integrate conversion of production and processing by-products into higher-value food or nonfood products, nutraceuticals, chemicals, and energy resources will be a critical part of the transition to a more sustainable food system. Organized by agricultural crop, and focusing on those crops with maximum economic impact, each chapter describes technologies for value-added processing of by-products which can be integrated into current food production systems. Integrated Processing Technologies for Food and Agricultural By-Products is a valuable resource for industry professionals, academics, and policy-makers alike. - Provides production-through-processing coverage of key agricultural crops for a thorough understanding and translational inspiration - Describes and discusses major by-product sources, including physical and chemical biomass characterizations and associated variability in detail - Highlights conversions accomplished through physical, biological, chemical, or thermal methods and demonstrates examples of those technologies




Visionary Manufacturing Challenges for 2020


Book Description

Manufacturing will unquestionably be a very different enterprise in 2020 from what it is today. This book presents an exciting picture of the profitable and productive potential of manufacturing two decades hence. This book takes an international view of future manufacturing that considers the leaps and bounds of technological innovation and the blurring of the lines between the manufacturing and service industries. The authors identify ten strategic technology areas as the most important for research and development and they recommend ways to address crosscutting questions. Representing a variety of industries, the authors identify six "grand challenges" that must be overcome for their vision to be realized, including the human/technology interface, environmental concerns, and miniaturization. A host of issues are discussed that will push and pull at manufacturing over the next 20 years: the changing workforce, the changing consumer, the rise of bio- and nanotechnology, the prospects for waste-free processing, simulation and modeling as design tools, shifts in global competition, and much more. The information and analyses in this book will be vitally important to everyone concerned about the future of manufacturing: policymakers, executives, design and engineering professionals, researchers, faculty, and students.




Electron-Beam Technology in Microelectronic Fabrication


Book Description

Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.




Optoelectronic Integration: Physics, Technology and Applications


Book Description

As we approach the end of the present century, the elementary particles of light (photons) are seen to be competing increasingly with the elementary particles of charge (electrons/holes) in the task of transmitting and processing the insatiable amounts of infonnation needed by society. The massive enhancements in electronic signal processing that have taken place since the discovery of the transistor, elegantly demonstrate how we have learned to make use of the strong interactions that exist between assemblages of electrons and holes, disposed in suitably designed geometries, and replicated on an increasingly fine scale. On the other hand, photons interact extremely weakly amongst themselves and all-photonic active circuit elements, where photons control photons, are presently very difficult to realise, particularly in small volumes. Fortunately rapid developments in the design and understanding of semiconductor injection lasers coupled with newly recognized quantum phenomena, that arise when device dimensions become comparable with electronic wavelengths, have clearly demonstrated how efficient and fast the interaction between electrons and photons can be. This latter situation has therefore provided a strong incentive to devise and study monolithic integrated circuits which involve both electrons and photons in their operation. As chapter I notes, it is barely fifteen years ago since the first demonstration of simple optoelectronic integrated circuits were realised using m-V compound semiconductors; these combined either a laser/driver or photodetector/preamplifier combination.




Unit Manufacturing Processes


Book Description

Manufacturing, reduced to its simplest form, involves the sequencing of product forms through a number of different processes. Each individual step, known as an unit manufacturing process, can be viewed as the fundamental building block of a nation's manufacturing capability. A committee of the National Research Council has prepared a report to help define national priorities for research in unit processes. It contains an organizing framework for unit process families, criteria for determining the criticality of a process or manufacturing technology, examples of research opportunities, and a prioritized list of enabling technologies that can lead to the manufacture of products of superior quality at competitive costs. The study was performed under the sponsorship of the National Science Foundation and the Defense Department's Manufacturing Technology Program.