Chemical Beam Epitaxy of Indium Nitride Using Seeded Supersonic Beams of Ammonia and Trimethyl-Indium


Book Description

Low-temperature growth of indium nitride (InN) films on gallium nitride(OOO1) substrates was achieved by supersonic jet epitaxy using ammonia (NH3) and trimethyl-indium (TMIn). Unfortunately, there was no indication of a reaction pathway involving TM In and NH3 that results in InN growth at temperatures less than approximately 500C. We infer that NH3 decomposition is the rate-limiting step in InN growth using NH3 and elemental In or TM In. Highly selective generation of ground-state nitrogen atoms for growth was accomplished using a radio-frequency (rf) discharge supersonic jet source. The rf discharge supersonic jet source was charartized by optical emission spectroscopy and time-of-flight appearance potential mass spectrometry.




Indium Nitride and Related Alloys


Book Description

Written by recognized leaders in this dynamic and rapidly expanding field, Indium Nitride and Related Alloys provides a clear and comprehensive summary of the present state of knowledge in indium nitride (InN) research. It elucidates and clarifies the often confusing and contradictory scientific literature to provide valuable and rigorous insight into the structural, optical, and electronic properties of this quickly emerging semiconductor material and its related alloys. Drawing from both theoretical and experimental perspectives, it provides a thorough review of all data since 2001 when the band gap of InN was identified as 0.7 eV. The superior transport and optical properties of InN and its alloys offer tremendous potential for a wide range of device applications, including high-efficiency solar cells and chemical sensors. Indeed, the now established narrow band gap nature of InN means that the InGaN alloys cover the entire solar spectrum and InAlN alloys span from the infrared to the ultraviolet. However, with unsolved problems including high free electron density, difficulty in characterizing p-type doping, and the lack of a lattice-matched substrate, indium nitride remains perhaps the least understood III-V semiconductor. Covering the epitaxial growth, experimental characterization, theoretical understanding, and device potential of this semiconductor and its alloys, this book is essential reading for both established researchers and those new to the field.













Chemical Abstracts


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The Materials Science of Thin Films


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Prepared as a textbook complete with problems after each chapter, specifically intended for classroom use in universities.




Semiconductor Nanostructures for Optoelectronic Applications


Book Description

Annotation Tiny structures measurable on the nanometer scale (one-billionth of a meter) are known as nanostructures, and nanotechnology is the emerging application of these nanostructures into useful nanoscale devices. As we enter the 21st century, more and more professional are using nanotechnology to create semiconductors for a variety of applications, including communications, information technology, medical, and transportation devices. Written by today's best researchers of semiconductor nanostructures, this cutting-edge resource provides a snapshot of this exciting and fast-changing field. The book covers the latest advances in nanotechnology and discusses the applications of nanostructures to optoelectronics, photonics, and electronics.




Thin Film Phenomena


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Supercritical Fluids as Solvents and Reaction Media


Book Description

Supercritical fluids behave either like a gas or a liquid, depending on the values of thermodynamic properties. This tuning of properties, and other advantageous properties of supercritical fluids led to innovative technologies. More than 100 plants of production size are now in operation worldwide in the areas of process and production technology, environmental applications, and particle engineering. New processes are under research and development in various fields. This book provides an overview of the research activities in the field of Supercritical Fluids in Germany. It is based on the research program "Supercritical fluids as solvents and reaction media" on the initiative of the "GVC-Fachausschuß Hochdruckverfahrenstechnik" (i.e. the German working party on High Pressure Chemical Engineering of the Society of Chemical Engineers).This research program provided an immensely valuable platform for exchange of knowledge and experience. More than 50 young researchers were involved contributing with their expertise, their new ideas, and the motivation of youth. The results of this innovative research are described in this book.- This book provides an overview of the research activities in the field of Supercritical Fluids in Germany- Contains results of projects within the research program on "Supercritical fluids as solvents and reaction media" on the initiative of the German working party on High Pressure Chemical Engineering of the Society of Chemical Engineers.- More than 50 young researchers were involved in contributing with their expertise, their new ideas, and the motivation of youth.