Crystal Growth and Evaluation of Silicon for VLSI and ULSI


Book Description

Silicon, as a single-crystal semiconductor, has sparked a revolution in the field of electronics and touched nearly every field of science and technology. Though available abundantly as silica and in various other forms in nature, silicon is difficult to separate from its chemical compounds because of its reactivity. As a solid, silicon is chemically inert and stable, but growing it as a single crystal creates many technological challenges. Crystal Growth and Evaluation of Silicon for VLSI and ULSI is one of the first books to cover the systematic growth of silicon single crystals and the complete evaluation of silicon, from sand to useful wafers for device fabrication. Written for engineers and researchers working in semiconductor fabrication industries, this practical text: Describes different techniques used to grow silicon single crystals Explains how grown single-crystal ingots become a complete silicon wafer for integrated-circuit fabrication Reviews different methods to evaluate silicon wafers to determine suitability for device applications Analyzes silicon wafers in terms of resistivity and impurity concentration mapping Examines the effect of intentional and unintentional impurities Explores the defects found in regular silicon-crystal lattice Discusses silicon wafer preparation for VLSI and ULSI processing Crystal Growth and Evaluation of Silicon for VLSI and ULSI is an essential reference for different approaches to the selection of the basic silicon-containing compound, separation of silicon as metallurgical-grade pure silicon, subsequent purification, single-crystal growth, and defects and evaluation of the deviations within the grown crystals.




Crystal Growth and Evaluation of Silicon for VLSI and ULSI


Book Description

Silicon, as a single-crystal semiconductor, has sparked a revolution in the field of electronics and touched nearly every field of science and technology. Though available abundantly as silica and in various other forms in nature, silicon is difficult to separate from its chemical compounds because of its reactivity. As a solid, silicon is chemical




Photovoltaic Solar Energy


Book Description

Photovoltaic Solar Energy Thoroughly updated overview of photovoltaic technology, from materials to modules and systems Volume 2 of Photovoltaic Solar Energy provides fundamental and contemporary knowledge about various photovoltaic technologies in the framework of material science, device physics of solar cells, chemistry for manufacturing, engineering of PV modules, and the design aspects of photovoltaic applications, with the aim of informing the reader about the basic knowledge of each aspect of photovoltaic technologies and applications in the context of the most recent advances in science and engineering. The text is written by leading specialists for each topic in a concise manner and includes the most recent references for deeper study. Moreover, the book gives insights into possible future developments in the field of photovoltaics. The book builds on the success of Volume 1 of Photovoltaic Solar Energy, which was published by Wiley in January 2017. As science and technology is progressing fast in some areas of photovoltaics, several topics needed to be readdressed. Volume 2 also covers some basic aspects of the subject that were not addressed in Volume 1. Sample topics covered in Photovoltaic Solar Energy include: Solar Irradiance Resources Crystalline Silicon Technologies (Cz Ingots, TOPCon, Heterojunction, Passivating contacts, Hydrogenation and Carrier Induced Degradation) Perovskite and Tandem solar cells Characterization and Measurements PV Modules PV Systems and Applications (integration in buildings, agriculture, water, vehicles) Sustainability Providing comprehensive coverage of the subject, Photovoltaic Solar Energy is an essential resource for undergraduate and graduate students in science or engineering, young professionals in PV research or the PV industry, professors, teachers, and PV specialists who want to receive updated information. A scientific or engineering degree is a prerequisite.




Oxygen in Silicon


Book Description

This volume reviews the latest understanding of the behavior and roles of oxygen in silicon, which will carry the field into the ULSI era from the experimental and theoretical points of view. The fourteen chapters, written by recognized authorities representing industrial and academic institutions, cover thoroughly the oxygen related phenomena from the crystal growth to device fabrication processes, as well as indispensable diagnostic techniques for oxygen. Comprehensive study of the behavior of oxygen in silicon Discusses silicon crystals for VLSI and ULSI applications Thorough coverage from crystal growth to device fabrication Edited by technical experts in the field Written by recognized authorities from industrial and academic institutions Useful to graduate students, scientists in other disciplines, and active participants in the arena of silicon-based microelectronics research 297 original line drawings




Semiconductor Silicon Crystal Technology


Book Description

Semiconductor Silicon Crystal Technology provides information pertinent to silicon, which is the dominant material in the semiconductor industry. This book discusses the technology of integrated circuits (ICs) in electronic materials manufacturer. Comprised of eight chapters, this book provides an overview of the basic science, silicon materials, IC device fabrication processes, and their interaction for enhancing both the processes and materials. This text then proceeds with a discussion of the atomic structure and bonding mechanisms in order to understand the nature and formation of crystal structures, which are the fundamentals of material science. Other chapters consider the technological crystallography and classify natural crystal morphologies based on observation. The final chapter deals with the interrelationships among silicon material characteristics, circuit design, and IC fabrication in order to ensure the fabrication of very-large-scale-integration/ultra-large-scale-integration circuits. This book is a valuable resource for graduate students, physicists, engineers, materials scientists, and professionals involved in semiconductor industry.










Silicon, Chemical Etching


Book Description

In the first contribution to this volume we read that the world-wide production of single crystal silicon amounts to some 2000 metric tons per year. Given the size of present-day silicon-crystals, this number is equivalent to 100000 silicon-crystals grown every year by either the Czochralski (80%) or the floating-zone (20%) technique. But, to the best of my knowledge, no coherent and comprehensive article has been written that deals with "the art and science", as well as the practical and technical aspects of growing silicon crystals by the Czochralski technique. The same could be said about the floating-zone technique were it not for the review article by W. Dietze, W. Keller and A. Miihlbauer which was published in the preceding Volume 5 ("Silicon") of this series (and for a monograph by two of the above authors published about the same time). As editor of this volume I am very glad to have succeeded in persuading two scien tists, W. Zulehner and D. Huber, of Wacker-Chemitronic GmbH - the world's largest producer of silicon-crystals - to write a comprehensive article about the practical and scientific aspects of growing silicon-crystals by the Czochralski method and about silicon wafer manufacture. I am sure that many scientists or engineers who work with silicon crystals -be it in the laboratory or in a production environment - will profit from the first article in this volume.




High Purity Silicon


Book Description




High Purity Silicon 9


Book Description

This issue discusses the latest developments in the growth, characterization, device processing and applications of high-purity silicon in either bulk or epitaxial form. Information is given on the control and prevention of impurity incorporation, characterization and detection of defects and impurity states. Device and circuit aspects are also covered. Advanced substrates such as SOI, strained Si and germanium-on-insulator are discussed.