Vacuum in Particle Accelerators


Book Description

A unique guide on how to model and make the best vacuum chambers Vacuum in Particle Accelerators offers a comprehensive overview of ultra-high vacuum systems that are used in charge particle accelerators. The book?s contributors ? noted experts in the field ? also highlight the design and modeling of vacuum particle accelerators. The book reviews vacuum requirements, identifies sources of gas in vacuum chambers and explores methods of removing them. In addition, Vacuum in Particle Accelerators offers an in-depth explanation of the control of the beam and the beam aperture. In the final part of the book, the focus is on the modelling approaches for vacuum chambers under various operating conditions. This important guide: -Offers a review of vacuum systems in charge particle accelerators -Contains contributions from an international panel of noted experts in the field -Highlights the systems, modelling, and design of vacuum particle accelerators -Includes information on vacuum requirements, beam-gas interactions, cryogenic temperatures, ion induced pressure instability, heavy ion machines -Presents the most up-to-date information on the topic for scientists and engineers Written for vacuum physicists, vacuum engineers, plasma physicists, materials scientists, and engineering scientists, Vacuum Particle Accelerators is an essential reference offering an in-depth exploration of vacuum systems and the modelling and design of charged particle accelerators.










Fundamentals of Vacuum Science and System Design for High and Ultrahigh Vacuum, Volume 1


Book Description

Fundamentals of Vacuum Science and System Design for High and Ultra-High Vacuum, Volume 1: Introduction to Vacuum and Systems details the important practical considerations in design of vacuum systems for various vacuum deposition technologies. Topics covered include: Introduction to vaccum and end uses, molecular density in vacuum, molecular flow in various vacuum regimes, characteristics of gas composition at various molecular densities, general principles of gas-solid interactions, vacuum pump technology, pressure sensors, leak detection and the impact of fundamental design decisions and operating practices on vacuum system performance. The introductory sections are designed to introduce the reader to basic concepts in vacuum technology. More detailed sections provide fundamental descriptions of basic vacuum pumps and pumping mechanisms in current practice and provides insight into the various pros and cons for each approach. System design, assembly, maintenance, and trouble-shooting are reviewed in detail. This volume also describes a wide range of pressure measurement approaches, and includes several key characterization techniques, example applications on systems for rough vacuum, high vacuum and ultra-high vacuum, as well as trade-offs in system design, allowing for the reader to develop an understanding of all the elements required for a successfully designed, assembled, and operating system.







Silicon Epitaxy


Book Description

Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded.




Nanoplasmonics


Book Description

Nanoplasmonics is a young topic of research, which is part of nanophotonics and nano-optics. Nanoplasmonics concerns to the investigation of electron oscillations in metallic nanostructures and nanoparticles. Surface plasmons have optical properties, which are very interesting. For instance, surface plasmons have the unique capacity to confine light at the nanoscale. Moreover, surface plasmons are very sensitive to the surrounding medium and the properties of the materials on which they propagate. In addition to the above, the surface plasmon resonances can be controlled by adjusting the size, shape, periodicity, and materials' nature. All these optical properties can enable a great number of applications, such as biosensors, optical modulators, photodetectors, and photovoltaic devices. This book is intended for a broad audience and provides an overview of some of the fundamental knowledges and applications of nanoplasmonics.




Fabrication Engineering at the Micro and Nanoscale


Book Description

Designed for advanced undergraduate or first-year graduate courses in semiconductor or microelectronic fabrication, the third edition of Fabrication Engineering at the Micro and Nanoscale provides a thorough and accessible introduction to all fields of micro and nano fabrication.




Spectroscopic Ellipsometry


Book Description

Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields.