Driven Morphological Evolution of Crystal Surfaces, Epitaxial Thin Films, and Two-dimensional Materials


Book Description

Properly controlled applied fields can stabilize planar surface morphology, reduce surface roughness, and drive the formation of intriguing nanoscale morphological features, providing a path toward precise nanopatterning for the development of electronic and photonic materials with optimal functionality. To study the surface morphological evolution of stressed crystalline solids and thin films, we have established a continuum model accounting for stresses, electric fields, temperature gradients, surface energy, wetting potential, and surface diffusional anisotropy. Based on linear stability analysis and self-consistent dynamical simulations, we found that long-wavelength plane-wave perturbations to a planar surface of a uniaxially stressed solid can trigger a nonlinear tip-splitting instability, while sufficiently strong and well controlled electric fields and thermal gradients can alone or synergistically stabilize the planar surface morphology. We established the electrical stressing as a viable physical approach for the surface roughness reduction in conducting thin films. We found that burying quantum dot (QD) arrays in substrate can be used to engineer the surface initial morphological perturbation of the substrate, leading to the formation of designed quantum dot molecules (QDM). We also found that thermal annealing of epitaxial QDs can induce extra thermal mismatch stress, leading to the further evolution of QDs to nanorings, or multiple concentric nanorings, which will eventually evolve into QDs. Moreover, we have conducted a systematic analysis of pore-edge interactions in graphene nanoribbons (GNRs) using first-principles density functional theory (DFT) calculations and molecular-statics (MS) and molecular-dynamics (MD) computations based on reliable interatomic potentials. We formulated the strongly attractive interactions for nanopores in the vicinity of GNR edges, which can drive the nanopore to migrate toward and coalesce with the GNR edge. The post-coalescence morphological evolution of an armchair GNR edge leads to the formation of a V-shaped edge pattern consisting of zigzag linear segments (facets). DFT calculations show that the zigzag segments forming at the armchair edges can be used to tune the bandgap of the GNR. The bandgap of the patterned GNRs exhibits a linear dependence on the density of the zigzag edge atoms, which is controlled by the size and concentration of the pores introduced in the defect-engineered GNR.




Handbook of Crystal Growth


Book Description

Volume IIIA Basic Techniques Handbook of Crystal Growth, Second Edition Volume IIIA (Basic Techniques), edited by chemical and biological engineering expert Thomas F. Kuech, presents the underpinning science and technology associated with epitaxial growth as well as highlighting many of the chief and burgeoning areas for epitaxial growth. Volume IIIA focuses on major growth techniques which are used both in the scientific investigation of crystal growth processes and commercial development of advanced epitaxial structures. Techniques based on vacuum deposition, vapor phase epitaxy, and liquid and solid phase epitaxy are presented along with new techniques for the development of three-dimensional nano-and micro-structures. Volume IIIB Materials, Processes, and Technology Handbook of Crystal Growth, Second Edition Volume IIIB (Materials, Processes, and Technology), edited by chemical and biological engineering expert Thomas F. Kuech, describes both specific techniques for epitaxial growth as well as an array of materials-specific growth processes. The volume begins by presenting variations on epitaxial growth process where the kinetic processes are used to develop new types of materials at low temperatures. Optical and physical characterizations of epitaxial films are discussed for both in situ and exit to characterization of epitaxial materials. The remainder of the volume presents both the epitaxial growth processes associated with key technology materials as well as unique structures such as monolayer and two dimensional materials. Volume IIIA Basic Techniques Provides an introduction to the chief epitaxial growth processes and the underpinning scientific concepts used to understand and develop new processes. Presents new techniques and technologies for the development of three-dimensional structures such as quantum dots, nano-wires, rods and patterned growth Introduces and utilizes basic concepts of thermodynamics, transport, and a wide cross-section of kinetic processes which form the atomic level text of growth process Volume IIIB Materials, Processes, and Technology Describes atomic level epitaxial deposition and other low temperature growth techniques Presents both the development of thermal and lattice mismatched streams as the techniques used to characterize the structural properties of these materials Presents in-depth discussion of the epitaxial growth techniques associated with silicone silicone-based materials, compound semiconductors, semiconducting nitrides, and refractory materials




Evolution of Thin Film Morphology


Book Description

The focus of this book is on modeling and simulations used in research on the morphological evolution during film growth. The authors emphasize the detailed mathematical formulation of the problem. The book will enable readers themselves to set up a computational program to investigate specific topics of interest in thin film deposition. It will benefit those working in any discipline that requires an understanding of thin film growth processes.




Stress-driven Surface Instabilities in Epitaxial Thin Films


Book Description

ABSTRACT: Heteroepitaxial thin films are essential components in many technological applications including optical, electronic and other functional devices. These films are also becoming important in the coating technologies for high-temperature materials applications. Typical heteroepitaxial systems involve one or more solid phases deposited on support structure called the substrate. Often the lattice and thermal mismatch in these systems results in significant elastic strains that, under the appropriate temperature conditions, drive mass transport by diffusion. Surface diffusion in these systems is usually a dominant mass transport mechanism that leads to morphological evolution of the surface. This evolution is called stress-driven morphological growth, and it has received much attention by materials modelers. In the current work, the problem of stress-driven morphological evolution in strained thin films is revisited; we develop a generalized formulation of this problem in the non-linear regime based upon a curvilinear coordinate formalism and finite element solution of the elastic sub-problem. This combination of methods facilitates the analysis of the onset of the instability and the early stage temporal evolution of the film surface. We apply our numerical scheme to surface wave, dot, pit, and ring morphologies and demonstrate the effects of model parameters on the incipient instabilities.




Mechanisms of Surface and Microstructure Evolution in Deposited Films and Film Structures:


Book Description

A wide variety of materials systems and deposition strategies have been developed to produce epitaxial and polycrystalline thin films. In particular, controlling the morphology and microstructure of metal films at the nanometer and/or micron scale has become crucial for applications such as giant magnetoresistive devices, contacts and diffusion barriers in integrated circuits and photovoltaics, and multilayer X-ray mirrors. This book, first published in 2001, focuses on the interactions between different mechanisms of microstructure evolution and film-growth conditions. Two sections of the volume, including a joint effort with Symposium R, Morphology and Dynamics of Crystal Surfaces in Molecular and Colloid Systems, highlight the fundamental mechanisms of epitaxial growth. Additional topics include: multilayers - stress in thin films; early stages of film growth - mechanical properties; texture in polycrystalline films; grain growth - barrier layers; and silicides and organic thin films - pulsed laser deposition.




Oriented Crystallization on Amorphous Substrates


Book Description

Present-day scienceand technology have become increasingly based on studies and applications of thin films. This is especiallytrue of solid-state physics, semiconduc tor electronics, integrated optics, computer science, and the like. In these fields, it is necessary to use filmswith an ordered structure, especiallysingle-crystallinefilms, because physical phenomena and effects in such films are most reproducible. Also, active parts of semiconductor and other devices and circuits are created, as a rule, in single-crystal bodies. To date, single-crystallinefilms have been mainly epitaxial (or heteroepitaxial); i.e., they have been grown on a single-crystalline substrate, and principal trends, e.g., in the evolution of integrated circuits (lCs), have been based on continuing reduction in feature size and increase in the number of components per chip. However, as the size decreases into the submicrometer range, technological and physical limitations in integrated electronics become more and more severe. It is generally believed that a feature size of about 0.1um will have a crucial character. In other words, the present two-dimensional ICs are anticipated to reach their limit of minimization in the near future, and it is realized that further increase of packing density and/or functions might depend on three-dimensional integration. To solve the problem, techniques for preparation of single-crystalline films on arbitrary (including amorphous) substrates are essential.




Morphological Organization in Epitaxial Growth and Removal


Book Description

This book provides a critical assessment of the current status and the likely future directions of thin-film growth, an area of exceptional technological importance. Its emphasis is on descriptions of the atomic-scale mechanisms controlling the dynamics and thermodynamics of the morphological evolution of the growth front of thin films in diverse systems of fundamental and technological significance. The book covers most of the original and important conceptual developments made in the 1990s. The articles, written by leading experts, are arranged in five major categories ? the theoretical basis, semiconductor-on-semiconductor growth, metal-on-metal growth, metal-on-semiconductor growth, and removal as the inverse process of growth. This book, the only one of its kind in this decade, will prove to be an indispensable reference source for active researchers, those having peripheral interest, and graduate students starting out in the field.




Multiscale Deformation and Fracture in Materials and Structures


Book Description

Modern Solid Mechanics considers phenomena at many levels, ranging from nano size at atomic scale through the continuum level at millimeter size to large structures at the tens of meter scale. The deformation and fracture behavior at these various scales are inextricably related to interdisciplinary methods derived from applied mathematics, physics, chemistry, and engineering mechanics. This book, in honor of James R. Rice, contains articles from his colleagues and former students that bring these sophisticated methods to bear on a wide range of problems. Articles discussing problems of deformation include topics of dislocation mechanics, second particle effects, plastic yield criterion on porous materials, hydrogen embrittlement, solid state sintering, nanophases at surfaces, adhesion and contact mechanics, diffuse instability in geomaterials, and percolation in metal deformation. In the fracture area, the topics include: elastic-plastic crack growth, dynamic fracture, stress intensity and J-integral analysis, stress-corrosion cracking, and fracture in single crystal, piezoelectric, composite and cementitious materials. The book will be a valuable resource for researchers in modern solid mechanics and can be used as reference or supplementary text in mechanical and civil engineering, applied mechanics, materials science, and engineering graduate courses on fracture mechanics, elasticity, plasticity, mechanics of materials or the application of solid mechanics to processing, and reliability of life predictions.




Evolution of Epitaxial Structure and Morphology: Volume 399


Book Description

The evolution of epitaxial structure and morphology has assumed enormous scientific and technological importance in many areas of materials science. From the growth of magnetic multilayers to the fabrication of semiconductor devices, it is generally recognized that an understanding of microstructural development is fundamental to the control of the electronic, magnetic and mechanical properties of thin films. This book from MRS focuses on the structure and morphology of epitaxial systems with a particular emphasis on the time evolution of these properties as growth proceeds. It brings together advances to assess the relative roles of wetting and cohesion, reconstruction, surface and interfacial energy, misfit stress, and defect generation and propagation. It covers a broad mix of work, from basic studies of epitaxial metals and semiconductors to their application in thin-film electronic materials technology. Topics include: growth monitoring and characterization; island-size distributions and kinetic roughening; surfactants, intermixing and alloying; evolution of large-scale structures; self-organized epitaxial structures; strain relaxation; strain relaxation; steps, adatoms and islands and interface roughness and interdiffusion.