Morphological Evolution of Electrodeposits and Electrochemical Processing in ULSI Fabrication and Electrodeposition of and on Semiconductors IV


Book Description

Papers in this volume are from the 199th ECS Meeting, held in Washington, DC, Spring 2001. Morphology evolution encompasses electrochemical processing in ULSI fabrication, shape evolution, growth habit, and microstructure of electrodeposits. The most prominent example at present is the electrochemical deposition of copper for ULSI interconnects. Many other electrochemical processes at various stages of emergence and development hold promise for the electronics industry and beyond.







X-ray Characterization of Nanostructured Energy Materials by Synchrotron Radiation


Book Description

Nowadays, nanomaterials are attracting huge attentions not only from a basic research point of view but also for their potential applications. Since finding the structure-property-processing relationships can open new windows in the application of materials, the material characterizations play a crucial role in the research and development of materials science. The increasing demand for energy with the necessity to find alternative renewable and sustainable energy sources leads to the rapid growth in attention to energy materials. In this book, the results of some outstanding researches on synchrotron-based characterization of nanostructured materials related to energy applications are presented.




Electrochemical Processing in ULSI Fabrication III


Book Description

"Held May 2000 in Toronto, Canada, as part of the 197th meeting of the Electrochemical Society."--Pref.










Electrochemical Processing in ULSI and MEMS 3


Book Description

The papers in this issue describe the latest advances in fundamental and practical aspects of electrochemical processes for fabrication of microelectronic devices and related structures. Topics range from plating to etching, chips to packages, mechanisms to models, through-silicon vias to nanotubes, tin to ruthenium, capping to cooling, porous gold to porous alumina, probe-card springs to solder balls, electroless deposition to CMP, TFT-LCDs to magnetic nanowires and beyond.




Advanced Nanoscale ULSI Interconnects: Fundamentals and Applications


Book Description

In Advanced ULSI interconnects – fundamentals and applications we bring a comprehensive description of copper-based interconnect technology for ultra-lar- scale integration (ULSI) technology for integrated circuit (IC) application. In- grated circuit technology is the base for all modern electronics systems. You can ?nd electronics systems today everywhere: from toys and home appliances to a- planes and space shuttles. Electronics systems form the hardware that together with software are the bases of the modern information society. The rapid growth and vast exploitation of modern electronics system create a strong demand for new and improved electronic circuits as demonstrated by the amazing progress in the ?eld of ULSI technology. This progress is well described by the famous “Moore’s law” which states, in its most general form, that all the metrics that describe integrated circuit performance (e. g. , speed, number of devices, chip area) improve expon- tially as a function of time. For example, the number of components per chip d- bles every 18 months and the critical dimension on a chip has shrunk by 50% every 2 years on average in the last 30 years. This rapid growth in integrated circuits te- nology results in highly complex integrated circuits with an increasing number of interconnects on chips and between the chip and its package. The complexity of the interconnect network on chips involves an increasing number of metal lines per interconnect level, more interconnect levels, and at the same time a reduction in the interconnect line critical dimensions.




Copper Electrodeposition for Nanofabrication of Electronics Devices


Book Description

This book discusses the scientific mechanism of copper electrodeposition and it's wide range of applications. The book will cover everything from the basic fundamentals to practical applications. In addition, the book will also cover important topics such as: • ULSI wiring material based upon copper nanowiring • Printed circuit boards • Stacked semiconductors • Through Silicon Via • Smooth copper foil for Lithium-Ion battery electrodes. This book is ideal for nanotechnologists, industry professionals, and practitioners.




Semiconductors, Metal Oxides, and Composites: Metallization and Electrodeposition of Thin Films and Nanostructures


Book Description

This symposium provided a forum for current work on the electrodeposition and characterization of functional coatings and nanostructures. Central issues include the control of size and architecture and the ample choices and demands of substrate and deposited materials. The focus materials of this symposium were semiconductors, oxides and composites with e.g. ceramic nanoparticles or nanotubes.