Gettering and Defect Engineering in Semiconductor Technology X


Book Description

GADEST 2003 Proceedings of the 10th International Autumn Meeting on Gettering anf Defect Engineering in Semiconductor Technology, September 21-26, 2003, Brandenburg, Germany




Gettering and Defect Engineering in Semiconductor Technology XV


Book Description

GADEST 2013 Selected, peer reviewed papers from the 15th Gettering and Defect Engineering in Semiconductor Technology (GADEST 2013), September 22-27, 2013, Oxford, UK







Gettering and Defect Engineering in Semiconductor Technology X


Book Description

This volume is a collection of papers presented at the 10th International Autumn Meeting on "Gettering and Defect Engineering in Semiconductor Technology - GADEST 2003," which took place from the 21st to the 26th of September 2003 at the Seehotel Zeuthen, in the state of Brandenburg, Germany. The Seehotel Zeuthen, near Berlin, was an excellent location at which to provide a forum for interactions between scientists and engineers engaged in the field of semiconductor defect physics, materials science and technology; and to reflect upon aspects of the coming era of conversion from micro-electronics to nano-electronics. In addition, a particular ambition was to strengthen the interactions and exchanges between communities working in the fields of crystalline silicon for electronics and photovoltaics. The book comprises 20 invited and 76 contributed papers from over 90 research institutions and from more than 20 countries. The invited papers, contributed by internationally recognized experts, review the state-of-the-art and expected future trends in their respective research fields. The book is organized into 11 sections: Advanced Silicon Materials; Oxygen-, Nitrogen- and Hydrogen-Related Phenomena; Crystalline Silicon for Solar Cells; Silicon-Germanium on Silicon; Extended Defects in Silicon and their Influence on Luminescence; Implantation-Related Phenomena; Point Defects, Impurities and Deep Levels; Dislocations in Semiconductors; Diagnostics, Characterization Techniques; Gettering; Future Aspects.










Gettering and Defect Engineering in Semiconductor Technology IV


Book Description

Proceedings of the 4th International Conference on Gettering and Defect Engineering In Semiconductor Technology (GADEST '91), Frankfurt, Germany, October 1991




Handbook of Semiconductor Manufacturing Technology


Book Description

Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.




Silicon Materials Science and Technology X


Book Description

This was the tenth symposium of the International Symposium on Silcon Material Science and Technology, going back to 1969. This issue provides a unique historical record of the program and will aid in the understanding of silicon materials over the last 35 years.




Gettering and Defect Engineering in Semiconductor Technology XIV


Book Description

GADEST 2011 Selected, peer reviewed papers from the XIVth International Biannual Meeting on Gettering and Defect Engineering in Semiconductor (GADEST 2011), September 25-30, 2011, Loipersdorf, Austria