Book Description
Next several experiments are conducted which establish a relation between processing parameters and the material properties of the resulting films. The processing parameters explored are the dilution of the process gasses, the temperature of the substrate, the type of substrate deposited on, the incident microwave power, and the chamber pressure during deposition. The optical, structural, and electrical properties of the films are characterized by UV/VIS/NIR Spectroscopy, Raman spectroscopy, x-ray diffraction, x-ray photoelectron spectroscopy, activation energy determination, photoreflectance spectroscopy and photosensitivity. The emphasis of the work is to establish basic material knowledge of a relatively new system and how processing parameters can be used to generate the desired material properties.
