Author : Luis Villablanca
Publisher :
Page : 103 pages
File Size : 50,47 MB
Release : 2000
Category : Semiconductors
ISBN : 9783896495839
Author : Kristin De Meyer
Publisher : Springer Science & Business Media
Page : 423 pages
File Size : 20,2 MB
Release : 2012-12-06
Category : Technology & Engineering
ISBN : 3709168279
This volume contains the proceedings of the 1998 International Conference on Simulation of Semiconductor Processes and Devices and provides an open forum for the presentation of the latest results and trends in modeling and simulation of semiconductor equipment, processes and devices. Topics include: • semiconductor equipment simulation • process modeling and simulation • device modeling and simulation of complex structures • interconnect modeling • integrated systems for process, device, circuit simulation and optimisation • numerical methods and algorithms • compact modeling and parameter extraction • modeling for RF applications • simulation and modeling of new devices (heterojunction based, SET’s, quantum effect devices, laser based ...)
Author : Dimitris Tsoukalas
Publisher : Springer Science & Business Media
Page : 463 pages
File Size : 41,69 MB
Release : 2012-12-06
Category : Technology & Engineering
ISBN : 3709162440
This volume contains the Proceedings of the International Conference on Simulation of Semiconductor Devices and Processes, SISPAD 01, held on September 5–7, 2001, in Athens. The conference provided an open forum for the presentation of the latest results and trends in process and device simulation. The trend towards shrinking device dimensions and increasing complexity in process technology demands the continuous development of advanced models describing basic physical phenomena involved. New simulation tools are developed to complete the hierarchy in the Technology Computer Aided Design simulation chain between microscopic and macroscopic approaches. The conference program featured 8 invited papers, 60 papers for oral presentation and 34 papers for poster presentation, selected from a total of 165 abstracts from 30 countries around the world. These papers disclose new and interesting concepts for simulating processes and devices.
Author :
Publisher :
Page : 368 pages
File Size : 40,92 MB
Release : 2005
Category : Semiconductors
ISBN :
Author : Siegfried Selberherr
Publisher : Springer Science & Business Media
Page : 525 pages
File Size : 14,61 MB
Release : 2012-12-06
Category : Computers
ISBN : 3709166578
The "Fifth International Conference on Simulation of Semiconductor Devices and Processes" (SISDEP 93) continues a series of conferences which was initiated in 1984 by K. Board and D. R. J. Owen at the University College of Wales, Swansea, where it took place a second time in 1986. Its organization was succeeded by G. Baccarani and M. Rudan at the University of Bologna in 1988, and W. Fichtner and D. Aemmer at the Federal Institute of Technology in Zurich in 1991. This year the conference is held at the Technical University of Vienna, Austria, September 7 - 9, 1993. This conference shall provide an international forum for the presentation of out standing research and development results in the area of numerical process and de vice simulation. The miniaturization of today's semiconductor devices, the usage of new materials and advanced process steps in the development of new semiconduc tor technologies suggests the design of new computer programs. This trend towards more complex structures and increasingly sophisticated processes demands advanced simulators, such as fully three-dimensional tools for almost arbitrarily complicated geometries. With the increasing need for better models and improved understand ing of physical effects, the Conference on Simulation of Semiconductor Devices and Processes brings together the simulation community and the process- and device en gineers who need reliable numerical simulation tools for characterization, prediction, and development.
Author : James Edward Greer
Publisher :
Page : 66 pages
File Size : 11,18 MB
Release : 2005
Category : Electronic dissertations
ISBN :
This thesis describes a new method to create three-dimensional finite element meshes using the horizons to mesh algorithm. The algorithm uses available geologic data and user-defined inputs to guide the mesh generation process. This new approach allows for material layer pinch outs and many different layer refinement options to create well-formed elements that better represent hydrogeologic formations. Two case studies are presented that demonstrate the application of the algorithm[alpha]s options and capabilities. A graphical interface for the algorithm was developed in the Groundwater Modeling System.
Author : Massimo Rudan
Publisher : Springer Nature
Page : 1680 pages
File Size : 36,28 MB
Release : 2022-11-10
Category : Technology & Engineering
ISBN : 3030798275
This Springer Handbook comprehensively covers the topic of semiconductor devices, embracing all aspects from theoretical background to fabrication, modeling, and applications. Nearly 100 leading scientists from industry and academia were selected to write the handbook's chapters, which were conceived for professionals and practitioners, material scientists, physicists and electrical engineers working at universities, industrial R&D, and manufacturers. Starting from the description of the relevant technological aspects and fabrication steps, the handbook proceeds with a section fully devoted to the main conventional semiconductor devices like, e.g., bipolar transistors and MOS capacitors and transistors, used in the production of the standard integrated circuits, and the corresponding physical models. In the subsequent chapters, the scaling issues of the semiconductor-device technology are addressed, followed by the description of novel concept-based semiconductor devices. The last section illustrates the numerical simulation methods ranging from the fabrication processes to the device performances. Each chapter is self-contained, and refers to related topics treated in other chapters when necessary, so that the reader interested in a specific subject can easily identify a personal reading path through the vast contents of the handbook.
Author : Heiner Ryssel
Publisher : Springer Science & Business Media
Page : 515 pages
File Size : 21,38 MB
Release : 2012-12-06
Category : Computers
ISBN : 3709166195
SISDEP ’95 provides an international forum for the presentation of state-of-the-art research and development results in the area of numerical process and device simulation. Continuously shrinking device dimensions, the use of new materials, and advanced processing steps in the manufacturing of semiconductor devices require new and improved software. The trend towards increasing complexity in structures and process technology demands advanced models describing all basic effects and sophisticated two and three dimensional tools for almost arbitrarily designed geometries. The book contains the latest results obtained by scientists from more than 20 countries on process simulation and modeling, simulation of process equipment, device modeling and simulation of novel devices, power semiconductors, and sensors, on device simulation and parameter extraction for circuit models, practical application of simulation, numerical methods, and software.
Author : Daniel S.H. Lo
Publisher : CRC Press
Page : 676 pages
File Size : 42,87 MB
Release : 2015-01-15
Category : Technology & Engineering
ISBN : 041569048X
Highlights the Progression of Meshing Technologies and Their Applications Finite Element Mesh Generation provides a concise and comprehensive guide to the application of finite element mesh generation over 2D domains, curved surfaces, and 3D space. Organised according to the geometry and dimension of the problem domains, it develops from the basic meshing algorithms to the most advanced schemes to deal with problems with specific requirements such as boundary conformity, adaptive and anisotropic elements, shape qualities, and mesh optimization. It sets out the fundamentals of popular techniques, including: Delaunay triangulation Advancing-front (ADF) approach Quadtree/Octree techniques Refinement and optimization-based strategies From the geometrical and the topological aspects and their associated operations and inter-relationships, each approach is vividly described and illustrated with examples. Beyond the algorithms, the book also explores the practice of using metric tensor and surface curvatures for generating anisotropic meshes on parametric space. It presents results from research including 3D anisotropic meshing, mesh generation over unbounded domains, meshing by means of intersection, re-meshing by Delaunay-ADF approach, mesh refinement and optimization, generation of hexahedral meshes, and large scale and parallel meshing, along with innovative unpublished meshing methods. The author provides illustrations of major meshing algorithms, pseudo codes, and programming codes in C++ or FORTRAN. Geared toward research centers, universities, and engineering companies, Finite Element Mesh Generation describes mesh generation methods and fundamental techniques, and also serves as a valuable reference for laymen and experts alike.
Author : Roland Kircher
Publisher : Birkhauser
Page : 140 pages
File Size : 48,17 MB
Release : 1991
Category : Science
ISBN :
