Phase-field Models for Simulating Physical Vapor Deposition and Microstructure Evolution of Thin Films


Book Description

The focus of this research is to develop, implement, and utilize phase-field models to study microstructure evolution in thin films during physical vapor deposition (PVD). There are four main goals to this dissertation. First, a phase-field model is developed to simulate PVD of a single-phase polycrystalline material by coupling previous modeling efforts on deposition of single-phase materials and grain evolution in polycrystalline materials. Second, a phase-field model is developed to simulate PVD of a polymorphic material by coupling previous modeling efforts on PVD of a single-phase material, evolution in multiphase materials, and phase nucleation. Third, a novel free energy functional is proposed that incorporates appropriate energetics and dynamics for simultaneous modeling of PVD and grain evolution in single-phase polycrystalline materials. Finally, these phase-field models are implemented into custom simulation codes and utilized to illustrate these models' capabilities in capturing PVD thin film growth, grain and grain boundary (GB) evolution, phase evolution and nucleation, and temperature evolution. In general, these simulations show: grain coarsening through grain rotation and GB migration such that grains tend to align with the thin film surface features and GBs migrate to locations between these features so that each surface feature has a distinct grain and orientation; the incident vapor flux rate controls the density of the thin film and the formation of surface and subsurface features; the substrate phase distribution initially acts as a template for the growing microstructure until the thin film becomes sufficiently thick; latent heat released during PVD increases the surface temperature of the thin film creating a temperature gradient within the thin film influencing phase evolution and nucleation; and temperature distributions lead to regions within the thin film that allow for multiple phases to be stable and coexist. Further, this work shows the sequential approach for coupling phase-field models, described in goals (i) and (ii) is sufficient to capture first-order features of the growth process, such as the stagnation of GBs at the valleys of the surface roughness, but to capture higher-order features, such as orientation gradients within columnar grains, the single free energy functional approach developed in goal (iii) is necessary.




Evolution of Thin Film Morphology


Book Description

The focus of this book is on modeling and simulations used in research on the morphological evolution during film growth. The authors emphasize the detailed mathematical formulation of the problem. The book will enable readers themselves to set up a computational program to investigate specific topics of interest in thin film deposition. It will benefit those working in any discipline that requires an understanding of thin film growth processes.







Experimental Observation and Computer Simulation of the Microstructure of Vapor Deposited Thin Films


Book Description

The microstructure of thin films applied by conventional physical vapor deposition for use as optical coatings is columnar for most of the materials commonly used. This has been established for about a decade through numerous experimental observations employing microfractographical replication for use with high resolution transmission electron microscopes. Scanning electron microscopes are more useful investigating coating defects, the most remarkable of these defects being known as nodules. From fundamental considerations of nucleation and growth of thin films, the origin of both columns and nodules, and the dependence of their appearance on the deposition conditions, are discussed in some detail. A simple 2-D simulation model assuming very limited surface mobility of adatoms or admolecules shows striking similarities to peculiar properties of both columnar and nodular growth seen in actual investigations. Conclusions are drawn as to how the two types of microstructures described influence general thin film properties, but in particular as to how they influence possible laser damage mechanisms.




Phase-Field Methods in Materials Science and Engineering


Book Description

This comprehensive and self-contained, one-stop source discusses phase-field methodology in a fundamental way, explaining advanced numerical techniques for solving phase-field and related continuum-field models. It also presents numerical techniques used to simulate various phenomena in a detailed, step-by-step way, such that readers can carry out their own code developments. Features many examples of how the methods explained can be used in materials science and engineering applications.




Phase-field Modeling of Multi-domain Evolution in Ferromagnetic Shape Memory Alloys and of Polycrystalline Thin Film Growth


Book Description

The phase-field method is a powerful tool in computer-aided materials science as it allows for the analysis of the time-spatial evolution of microstructures on the mesoscale. A multi-phase-field model is adopted to run numerical simulations in two different areas of scientific interest: Polycrystalline thin films growth and the ferromagnetic shape memory effect. FFT-techniques, norm conservative integration and RVE-methods are necessary to make the coupled problems numerically feasible.




Programming Phase-Field Modeling


Book Description

This textbook provides a fast-track pathway to numerical implementation of phase-field modeling—a relatively new paradigm that has become the method of choice for modeling and simulation of microstructure evolution in materials. It serves as a cookbook for the phase-field method by presenting a collection of codes that act as foundations and templates for developing other models with more complexity. Programming Phase-Field Modeling uses the Matlab/Octave programming package, simpler and more compact than other high-level programming languages, providing ease of use to the widest audience. Particular attention is devoted to the computational efficiency and clarity during development of the codes, which allows the reader to easily make the connection between the mathematical formulism and the numerical implementation of phase-field models. The background materials provided in each case study also provide a forum for undergraduate level modeling-simulations courses as part of their curriculum.




Microstructure Sensitive Design for Performance Optimization


Book Description

The accelerating rate at which new materials are appearing, and transforming the engineering world, only serves to emphasize the vast potential for novel material structure and related performance. Microstructure Sensitive Design for Performance Optimization (MSDPO) embodies a new methodology for systematic design of material microstructure to meet the requirements of design in optimal ways. Intended for materials engineers and researchers in industry, government and academia as well as upper level undergraduate and graduate students studying material science and engineering, MSDPO provides a novel mathematical framework that facilitates a rigorous consideration of the material microstructure as a continuous design variable in the field of engineering design. Presents new methods and techniques for analysis and optimum design of materials at the microstructure level Authors' methodology introduces spectral approaches not available in previous texts, such as the incorporation of crystallographic orientation as a variable in the design of engineered components with targeted elastic properties Numerous illustrations and examples throughout the text help readers grasp the concepts




An Improved Model of Thin Film Growth


Book Description

A VAX-11/785 computer was used to simulate the two dimensional growth of thin films produced by vapor deposition. In this model molecules and impurities were represented by three different sized disks. In order to simulate varying deposition conditions and evaporants, several variable parameters were introduced. Among these parameters were the variation of the deposition angle about some main angle, the mobility of the disks upon collision, the ability to introduce impurities into the microstructure, the simulation of multilayered coatings and the ability to introduce imperfections into the substrate. The results obtained by this model show that disks can be used to simulate some of the main features exhibited by vapor deposited films. Among these features are the formation of columns and their compliance with the tangent rule, and the dissappearance of this structure in the case of large disk mobility. Another feature found to be exhibited in the modeled films is that under certain conditions impurities and substrate imperfections can produce large voids and/or nodules. Other characteristics found in the simulated films include pores which could allow water absorption, and increased packing density for films produced with angle variations along with a moderate amount of disk mobility.