Physics and Technology of High-k Materials 9
Author : S. Kar
Publisher : The Electrochemical Society
Page : 504 pages
File Size : 31,43 MB
Release : 2011
Category :
ISBN : 1607682575
Author : S. Kar
Publisher : The Electrochemical Society
Page : 504 pages
File Size : 31,43 MB
Release : 2011
Category :
ISBN : 1607682575
Author : Samares Kar
Publisher : The Electrochemical Society
Page : 676 pages
File Size : 49,49 MB
Release : 2007
Category : Dielectrics
ISBN : 1566775701
This issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Author : Samares Kar
Publisher : The Electrochemical Society
Page : 621 pages
File Size : 32,63 MB
Release : 2010-10
Category : Science
ISBN : 1566778220
The issue of ECS Transactions will cover comprehensively all the aspects of high-k material physics and technology: Diverse High Mobility Substrates, High-k Materials, Metal Gate Electrode Materials, Deposition Techniques, Bulk Material Properties, Flat-Band Voltage Issues and Control, Interfaces, Gate Stack Reliability, Electrical, Chemical, and Physical Chatracterization, Novel Applications, High-k and Diverse Insulators for Photonics, High-k Processing/ Manufacturing.
Author : Gang He
Publisher : John Wiley & Sons
Page : 560 pages
File Size : 22,96 MB
Release : 2012-08-10
Category : Technology & Engineering
ISBN : 3527646361
A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.
Author : Samares Kar
Publisher : The Electrochemical Society
Page : 565 pages
File Size : 31,11 MB
Release : 2006
Category : Dielectrics
ISBN : 1566775035
This issue covers, in detail, all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Author : Samares Kar
Publisher :
Page : 330 pages
File Size : 30,24 MB
Release : 2003
Category : Science
ISBN :
Author : Samares Kar
Publisher : The Electrochemical Society
Page : 512 pages
File Size : 39,26 MB
Release : 2004
Category : Science
ISBN : 9781566774055
"This volume is the proceedings of The Second International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues ... and was held during [the] 204th Meeting [of the Electrochemical Society] ..."--P. v.
Author : S. Kar
Publisher : The Electrochemical Society
Page : 550 pages
File Size : 43,26 MB
Release : 2008-10
Category : Dielectrics
ISBN : 1566776511
The issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, novel and still higher permittivity dielectric materials, CMOS processing with high-K layers, metals for gate electrodes, interface issues, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Author : Samares Kar
Publisher : Springer Science & Business Media
Page : 515 pages
File Size : 34,20 MB
Release : 2013-06-25
Category : Technology & Engineering
ISBN : 3642365353
"The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, metal gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack materials, ternary hafnia and lanthania based high-k gate stack films, crystalline high-k oxides, high mobility substrates, and parameter extraction. Each chapter begins with the basics necessary for understanding the topic, followed by a comprehensive review of the literature, and ultimately graduating to the current status of the technology and our scientific understanding and the future prospects." .
Author : Asim K. Ray
Publisher : John Wiley & Sons
Page : 628 pages
File Size : 12,93 MB
Release : 2021-04-12
Category : Technology & Engineering
ISBN : 1119529476
Oxide Electronics Multiple disciplines converge in this insightful exploration of complex metal oxides and their functions and properties Oxide Electronics delivers a broad and comprehensive exploration of complex metal oxides designed to meet the multidisciplinary needs of electrical and electronic engineers, physicists, and material scientists. The distinguished author eschews complex mathematics whenever possible and focuses on the physical and functional properties of metal oxides in each chapter. Each of the sixteen chapters featured within the book begins with an abstract and an introduction to the topic, clear explanations are presented with graphical illustrations and relevant equations throughout the book. Numerous supporting references are included, and each chapter is self-contained, making them perfect for use both as a reference and as study material. Readers will learn how and why the field of oxide electronics is a key area of research and exploitation in materials science, electrical engineering, and semiconductor physics. The book encompasses every application area where the functional and electronic properties of various genres of oxides are exploited. Readers will also learn from topics like: Thorough discussions of High-k gate oxide for silicon heterostructure MOSFET devices and semiconductor-dielectric interfaces An exploration of printable high-mobility transparent amorphous oxide semiconductors Treatments of graphene oxide electronics, magnetic oxides, ferroelectric oxides, and materials for spin electronics Examinations of the calcium aluminate binary compound, perovoksites for photovoltaics, and oxide 2Degs Analyses of various applications for oxide electronics, including data storage, microprocessors, biomedical devices, LCDs, photovoltaic cells, TFTs, and sensors Suitable for researchers in semiconductor technology or working in materials science, electrical engineering, and physics, Oxide Electronics will also earn a place in the libraries of private industry researchers like device engineers working on electronic applications of oxide electronics. Engineers working on photovoltaics, sensors, or consumer electronics will also benefit from this book.