Author : Vikram J. Kapoor
Publisher :
Page : 570 pages
File Size : 30,53 MB
Release : 1987
Category : Electric and insulation
ISBN :
Author : M. Jamal Deen
Publisher : The Electrochemical Society
Page : 610 pages
File Size : 25,49 MB
Release : 1997
Category : Science
ISBN : 9781566771375
Author : Electrochemical Society. Meeting
Publisher : The Electrochemical Society
Page : 652 pages
File Size : 21,38 MB
Release : 2003
Category : Science
ISBN : 9781566773478
Author : Vikram J. Kapoor
Publisher : The Electrochemical Society
Page : 644 pages
File Size : 17,28 MB
Release : 1994
Category : Science
ISBN : 9781566770484
Author :
Publisher :
Page : 306 pages
File Size : 35,23 MB
Release : 1999
Category : Silicon dioxide
ISBN :
Author : Electrochemical Society. Dielectric Science and Technology Division
Publisher : The Electrochemical Society
Page : 304 pages
File Size : 34,1 MB
Release : 2001
Category : Science
ISBN : 9781566773133
Author : Ram Ekwal Sah
Publisher : The Electrochemical Society
Page : 606 pages
File Size : 41,89 MB
Release : 2005
Category : Nature
ISBN : 9781566774598
Author : K. B. Sundaram
Publisher : The Electrochemical Society
Page : 300 pages
File Size : 28,83 MB
Release : 1999
Category : Science
ISBN : 9781566772280
Author : Ram Ekwal Sah
Publisher : The Electrochemical Society
Page : 863 pages
File Size : 46,84 MB
Release : 2007
Category : Dielectric films
ISBN : 1566775523
This issue of ECS Transactions contains the papers presented in the symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectics held May 6-11, 2007 in Chicago. Papers were presented on deposition, characterization and applications of the dielectrics including high- and low-k dielectrics, as well as interface states, device characterization, reliabiliy and modeling.
Author : R. Ekwal Sah
Publisher : The Electrochemical Society
Page : 871 pages
File Size : 11,68 MB
Release : 2009
Category : Dielectric films
ISBN : 1566777100
The issue of ECS Transactions contains papers presented at the Tenth International Symposium on Silicon Nitride, Silicon Dioxide, and Alternate Emerging Dielectrics held in San Francisco on May 24-29, 2009. The papers address a very wide range of fabrication and characterization techniques, and applications of thin dielectric films in microelectronic and optoelectronic devices. More specific topics addressed by the papers include reliability, interface states, gate oxides, passivation, and dielctric breakdown.
