Author : M. Meyyappan
Publisher : The Electrochemical Society
Page : 644 pages
File Size : 27,87 MB
Release : 1995
Category : Technology & Engineering
ISBN : 9781566770965
Author : M. Meyyappan
Publisher : The Electrochemical Society
Page : 366 pages
File Size : 11,71 MB
Release : 1997
Category : Technology & Engineering
ISBN : 9781566771368
Author : P.F. Williams
Publisher : Springer Science & Business Media
Page : 610 pages
File Size : 44,55 MB
Release : 2013-11-11
Category : Technology & Engineering
ISBN : 9401158843
Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Author : Gary S. May
Publisher : John Wiley & Sons
Page : 428 pages
File Size : 44,51 MB
Release : 2006-05-26
Category : Technology & Engineering
ISBN : 0471790273
A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Controlcovers all issues involved in manufacturing microelectronic devicesand circuits, including fabrication sequences, process control,experimental design, process modeling, yield modeling, and CIM/CAMsystems. Readers are introduced to both the theory and practice ofall basic manufacturing concepts. Following an overview of manufacturing and technology, the textexplores process monitoring methods, including those that focus onproduct wafers and those that focus on the equipment used toproduce wafers. Next, the text sets forth some fundamentals ofstatistics and yield modeling, which set the foundation for adetailed discussion of how statistical process control is used toanalyze quality and improve yields. The discussion of statistical experimental design offers readers apowerful approach for systematically varying controllable processconditions and determining their impact on output parameters thatmeasure quality. The authors introduce process modeling concepts,including several advanced process control topics such asrun-by-run, supervisory control, and process and equipmentdiagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and managementof overall manufacturing systems * Chapters include case studies, sample problems, and suggestedexercises * Instructor support includes electronic copies of the figures andan instructor's manual Graduate-level students and industrial practitioners will benefitfrom the detailed exami?nation of how electronic materials andsupplies are converted into finished integrated circuits andelectronic products in a high-volume manufacturingenvironment. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment. An Instructor Support FTP site is also available.
Author : Electrochemical Society. High Temperature Materials Division
Publisher : The Electrochemical Society
Page : 526 pages
File Size : 14,76 MB
Release : 2001
Category : Science
ISBN : 9781566773195
Author :
Publisher : Academic Press
Page : 325 pages
File Size : 41,67 MB
Release : 1999-10-29
Category : Science
ISBN : 0080864619
Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded. Reflecting the truly interdisciplinary nature of the field that the series covers, the volumes in Semiconductors and Semimetals have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineers in modern industry.
Author : Charles J. Alpert
Publisher : CRC Press
Page : 1024 pages
File Size : 33,73 MB
Release : 2008-11-12
Category : Computers
ISBN : 1420013483
The physical design flow of any project depends upon the size of the design, the technology, the number of designers, the clock frequency, and the time to do the design. As technology advances and design-styles change, physical design flows are constantly reinvented as traditional phases are removed and new ones are added to accommodate changes in
Author : James Kwok
Publisher : Springer Science & Business Media
Page : 670 pages
File Size : 24,10 MB
Release : 2010-05-20
Category : Computers
ISBN : 3642133177
This book and its sister volume constitute the proceedings of the 7th International Symposium on Neural Networks, ISNN 2010, held in Shanghai, China, June 6-9, 2010. The 170 revised full papers of Part I and Part II were carefully selected from 591 submissions and focus on topics such as SVM and Kernel Methods, Vision and Image, Data Mining and Text Analysis, BCI and Brain Imaging and its applications. The first volume, Part I (LNCS 6063) covers the following topics: Neuropysiological Foundation, Theory and Models, Learning and Inference, and Nerodynamics.
Author : Uwe Kortshagen
Publisher : Springer
Page : 553 pages
File Size : 23,4 MB
Release : 2006-04-11
Category : Science
ISBN : 0306470764
This book resulted from the NATO Advanced Research Workshop on “Electron Kinetics and Applications of Glow Discharges,” held in St. Petersburg, Russia, on May 19-23, 1997. Glow discharges have found widespread applications in many technological processes from the manufacture of semiconductors, to recent developments in na- technology, to the traditional fields of gas lasers, and discharge lamps. Consequently, the interest in the physics of glow discharges has experienced yet another resurgence of interest. While the non-equilibrium character of glow discharges is widely accepted, the opinion still prevails that the main features can be captured by fluid models, and that kinetic treatments are only required for the understanding of subtle details. The erroneousness of this belief is demonstrated by the failure of fluid models to describe many basic features of glow discharges such as, for instance, electrode phenomena, striations, and collisionless heating effects. An adequate description of glow discharges thus has to be of kinetic nature.
Author : B-t Chu
Publisher : World Scientific
Page : 273 pages
File Size : 48,42 MB
Release : 1992-08-31
Category : Phase space (Statistical physics)
ISBN : 9814520446
This volume demonstrates that the key to the modeling, diagnosis and control of the next generation manufacturing processes is to integrate knowledge-based systems with traditional techniques. An up-to-date study is given here of this relatively recent development.The book is for those working primarily with traditional techniques and those working in the knowledge-based systems field. Both sets of readers will find it to be a source of many specific ideas about the integration of knowledge-based systems with traditional techniques, and carrying a wealth of useful references.
