Plasma Processing of Materials


Book Description

Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.







Plasma Catalysis


Book Description

Plasma catalysis is gaining increasing interest for various gas conversion applications, such as CO2 conversion into value-added chemicals and fuels, N2 fixation for the synthesis of NH3 or NOx, methane conversion into higher hydrocarbons or oxygenates. It is also widely used for air pollution control (e.g., VOC remediation). Plasma catalysis allows thermodynamically difficult reactions to proceed at ambient pressure and temperature, due to activation of the gas molecules by energetic electrons created in the plasma. However, plasma is very reactive but not selective, and thus a catalyst is needed to improve the selectivity. In spite of the growing interest in plasma catalysis, the underlying mechanisms of the (possible) synergy between plasma and catalyst are not yet fully understood. Indeed, plasma catalysis is quite complicated, as the plasma will affect the catalyst and vice versa. Moreover, due to the reactive plasma environment, the most suitable catalysts will probably be different from thermal catalysts. More research is needed to better understand the plasma–catalyst interactions, in order to further improve the applications.




Nonthermal Plasma Chemistry and Physics


Book Description

In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant diagnostic techniques, and selected applications. Elucidating interconnections and trends, the book focuses on basic principles and illustrations across a broad field of applications. Expert contributors address environmental aspects of plasma chemistry. The book also includes selected plasma conditions and specific applications in volume plasma chemistry and treatment of material surfaces such as plasma etching in microelectronics, chemical modification of polymer surfaces and deposition of functional thin films. Designed for students of plasma physics, Nonthermal Plasma Chemistry and Physics is a concise resource also for specialists in this and related fields of research.




Plasma Chemistry


Book Description

Plasma Chemistry is a collection of papers dealing with chemi-ionization kinetics, elementary chemical processes, kinetics in a non-equilibrium orquasi-equilibrium plasma, and heterogeneous reactions in plasmas of moderate pressure. Several papers discuss spectrometric plasma diagnostics, organic syntheses under plasma conditions, and the survival of plasma chemistry. One paper reviews chemi-ionization reactions, including reactions involving an electronically excited collision partner in which Penning ionization comparisons can be made. The paper also shows that observations made on noble gas metastables do not in apply to reactions of other species. Another paper analyzes the mechanism of plasma chemical reactions occurring under electron impact and through electronic-vibrational excited states. In these states, mutual influence of vibrational relaxation and dissociation becomes significant under low temperature plasma conditions. One paper discusses plasma techniques that have been applied to carry out various types of isomerizations or eliminations with high yields. The paper also shows the possibility of generating reactive species (atoms, radicals, carbenes) by these methods. The collection can prove useful for researchers, technicians, or scientists whose works involve organic chemistry, analytical chemistry, and other related fields of chemistry, such as physical chemistry and inorganic chemistry.




Plasma Chemistry


Book Description

Providing a fundamental introduction to all aspects of modern plasma chemistry, this book describes mechanisms and kinetics of chemical processes in plasma, plasma statistics, thermodynamics, fluid mechanics and electrodynamics, as well as all major electric discharges applied in plasma chemistry. Fridman considers most of the major applications of plasma chemistry, from electronics to thermal coatings, from treatment of polymers to fuel conversion and hydrogen production and from plasma metallurgy to plasma medicine. It is helpful to engineers, scientists and students interested in plasma physics, plasma chemistry, plasma engineering and combustion, as well as chemical physics, lasers, energy systems and environmental control. The book contains an extensive database on plasma kinetics and thermodynamics and numerical formulas for practical calculations related to specific plasma-chemical processes and applications. Problems and concept questions are provided, helpful in courses related to plasma, lasers, combustion, chemical kinetics, statistics and thermodynamics, and high-temperature and high-energy fluid mechanics.




Plasma Science


Book Description

Plasma Science and Engineering transforms fundamental scientific research into powerful societal applications, from materials processing and healthcare to forecasting space weather. Plasma Science: Enabling Technology, Sustainability, Security and Exploration discusses the importance of plasma research, identifies important grand challenges for the next decade, and makes recommendations on funding and workforce. This publication will help federal agencies, policymakers, and academic leadership understand the importance of plasma research and make informed decisions about plasma science funding, workforce, and research directions.




Elementary Processes in Hydrogen-Helium Plasmas


Book Description

Atomic and molecular processes play an important role in laboratory and astrophysical plasmas for a wide range of conditions, and determine, in part, their electrical, transport, thermal, and radiation properties. The study of these and other plasma properties requires a knowledge of the cross sections, reaction rate coefficients, and inelastic energy transfers for a variety of collisional reactions. In this review, we provide quantitative information about the most important collision processes occurring in hy drogen, helium, and hydrogen-helium plasmas in the temperature range from 0. 1 eV to 20 keY. The material presented here is based on published atomic and molecular collision data, theoretical calculations, and appro priate extrapolation and interpolation procedures. This review gives the properties of each reaction, graphs of the cross sections and reaction rate coeffiCients, and the coefficients of analytical fits for these quantities. We present this information in a form that will enable researchers who are not experts in atomic physics to use the data easily. The authors thank their colleagues at the Princeton Plasma Physics Laboratory and in the atomic physics community who have made many useful suggestions for the selection and presentation o. f t. he material. We gratefully acknowledge the excellent technical assistance of Elizabeth Carey for the typing, and Bernie Giehl for the drafting. This work was supported in part by the U. S. Department of Energy Contract No. DE-AC02-76-CHO-3073. Princeton, USA R. K. Janev W. D. Langer September, 1987 K. Evans, Jr. , D. E.