Reflection High Energy Electron Diffraction Studies of Interface Formation
Author : Paul Pukite
Publisher : Paul Pukite
Page : 195 pages
File Size : 49,3 MB
Release : 1988
Category :
ISBN : 0964474123
Author : Paul Pukite
Publisher : Paul Pukite
Page : 195 pages
File Size : 49,3 MB
Release : 1988
Category :
ISBN : 0964474123
Author : Paul Pukite
Publisher : Paul Pukite
Page : 398 pages
File Size : 14,54 MB
Release : 1988
Category :
ISBN :
Author : Ayahiko Ichimiya
Publisher : Cambridge University Press
Page : 370 pages
File Size : 34,63 MB
Release : 2004-12-13
Category : Science
ISBN : 9780521453738
Publisher Description
Author : P.K. Larsen
Publisher : Springer Science & Business Media
Page : 526 pages
File Size : 22,70 MB
Release : 2012-12-06
Category : Science
ISBN : 146845580X
This volume contains the papers presented at the NATO Advanced Research Workshop in "Reflection High Energy Electron Diffraction and Reflection Electron Imaging of Surfaces" held at the Koningshof conference center, Veldhoven, the Netherlands, June 15-19, 1987. The main topics of the workshop, Reflection High Energy Electron Diffraction (RHEED) and Reflection Electron Microscopy (REM), have a common basis in the diffraction processes which high energy electrons undergo when they interact with solid surfaces at grazing angles. However, while REM is a new technique developed on the basis of recent advances in transmission electron microscopy, RHEED is an old method in surface crystallography going back to the discovery of electron diffraction in 1927 by Davisson and Germer. Until the development of ultra high vacuum techniques in the 1960's made instruments using slow electrons more accessable, RHEED was the dominating electron diffraction technique. Since then and until recently the method of Low Energy Electron Diffraction (LEED) largely surpassed RHEED in popularity in surface studies. The two methods are closely related of course, each with its own specific advantages. The grazing angle geometry of RHEED has now become a very useful feature because this makes it ideally suited for combination with the thin growth technique of Molecular Beam Epitaxy (MBE). This combination allows in-situ studies of freshly grown and even growing surfaces, opening up new areas of research of both fundamental and technological importance.
Author : L.-M. Peng
Publisher : Oxford University Press, USA
Page : 580 pages
File Size : 15,2 MB
Release : 2004
Category : Science
ISBN : 9780198500742
This book is an in-depth treatment of the theoretical background relevant to an understanding of materials that can be obtained by using high-energy electron diffraction and microscopy.
Author : Mohamed Henini
Publisher : Elsevier
Page : 790 pages
File Size : 16,29 MB
Release : 2018-06-27
Category : Science
ISBN : 0128121378
Molecular Beam Epitaxy (MBE): From Research to Mass Production, Second Edition, provides a comprehensive overview of the latest MBE research and applications in epitaxial growth, along with a detailed discussion and 'how to' on processing molecular or atomic beams that occur on the surface of a heated crystalline substrate in a vacuum. The techniques addressed in the book can be deployed wherever precise thin-film devices with enhanced and unique properties for computing, optics or photonics are required. It includes new semiconductor materials, new device structures that are commercially available, and many that are at the advanced research stage. This second edition covers the advances made by MBE, both in research and in the mass production of electronic and optoelectronic devices. Enhancements include new chapters on MBE growth of 2D materials, Si-Ge materials, AIN and GaN materials, and hybrid ferromagnet and semiconductor structures. - Condenses the fundamental science of MBE into a modern reference, speeding up literature review - Discusses new materials, novel applications and new device structures, grounding current commercial applications with modern understanding in industry and research - Includes coverage of MBE as mass production epitaxial technology and how it enhances processing efficiency and throughput for the semiconductor industry and nanostructured semiconductor materials research community
Author : Alvin W. Czanderna
Publisher : Springer Science & Business Media
Page : 316 pages
File Size : 29,44 MB
Release : 2006-04-11
Category : Science
ISBN : 0306469138
With the development in the 1960s of ultrahigh vacuum equipment and techniques and electron, X-ray, and ion beam techniques to determine the structure and composition of interfaces, activities in the field of surface science grew nearly exponentially. Today surface science impacts all major fields of study from physical to biological sciences, from physics to chemistry, and all engineering disciplines. The materials and phenomena characterized by surface science range from se- conductors, where the impact of surface science has been critical to progress, to metals and ceramics, where selected contributions have been important, to bio- terials, where contributions are just beginning to impact the field, to textiles, where the impact has been marginal. With such a range of fields and applications, questions about sample selection, preparation, treatment, and handling are difficult to cover completely in one review article or one chapter. Therefore, the editors of this book have assembled a range of experts with experience in the major fields impacted by surface characterization. It is the only book which treats the subject of sample handling, preparation, and treatment for surface characterization. It is full of tricks, cautions, and handy tips to make the laboratory scientist’s life easier. With respect to organization of the book, the topics range from discussion of vacuum to discussion of biological, organic, elemental or compound samples, to samples prepared ex situ or in situ to the vacuum, to deposition ofthin films. Generic considerations of sample preparation are also given.
Author : Victor E. Borisenko
Publisher : Springer Science & Business Media
Page : 362 pages
File Size : 35,15 MB
Release : 2013-03-07
Category : Technology & Engineering
ISBN : 3642596495
A comprehensive presentation and analysis of properties and methods of formation of semiconducting silicides. Fundamental electronic, optical and transport properties of the silicides collected from recent publications will help readers choose their application in new generations of solid-state devices. A comprehensive presentation of thermodynamic and kinetic data is given in combination with their technical application, as is information on corresponding thin-film or bulk crystal formation techniques.
Author : Michael Grunze
Publisher : Springer Science & Business Media
Page : 211 pages
File Size : 38,2 MB
Release : 2012-12-06
Category : Science
ISBN : 3642736327
Diffusion in solids and at interfaces is a very active area of research, as the contributions to this volume attest.
Author : Alessio Innocenti
Publisher : BoD – Books on Demand
Page : 452 pages
File Size : 22,39 MB
Release : 2012-04-11
Category : Technology & Engineering
ISBN : 9535105124
The aim of this book is to provide an overview on the importance of stoichiometry in the materials science field. It presents a collection of selected research articles and reviews providing up-to-date information related to stoichiometry at various levels. Being materials science an interdisciplinary area, the book has been divided in multiple sections, each for a specific field of applications. The first two sections introduce the role of stoichiometry in nanotechnology and defect chemistry, providing examples of state-of-the-art technologies. Section three and four are focused on intermetallic compounds and metal oxides. Section five describes the importance of stoichiometry in electrochemical applications. In section six new strategies for solid phase synthesis are reported, while a cross sectional approach to the influence of stoichiometry in energy production is the topic of the last section. Though specifically addressed to readers with a background in physical science, I believe this book will be of interest to researchers working in materials science, engineering and technology.