Standard Guide for Depth Profiling in Auger Electron Spectroscopy
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Publisher :
Page : 0 pages
File Size : 44,89 MB
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Author :
Publisher :
Page : 0 pages
File Size : 44,89 MB
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Author : G. McGuire
Publisher : Springer Science & Business Media
Page : 144 pages
File Size : 40,16 MB
Release : 2013-03-09
Category : Science
ISBN : 1475717024
Auger electron spectroscopy (AES) is based on the Auger total secondary electron energy distribution, and an ion gun to process, which involves the core-level ionization of an atom with provide depth profiling capability. subsequent deexcitation occurring by an outer-level electron de The high surface sensitivity of Auger spectroscopy which dictates caying to fill the core hole. The excess energy is transferred to the need for an ultrahigh-vacuum system is due to the limited and causes the ejection of another electron, which is by definition mean free path of electrons in the 0-3000 e V kinetic energy an Auger electron. The Auger electron transition, denoted by range. The Auger peaks decay exponentially with overlayer cov the electron levels involved, is independent of the excitation erage, which is consistent with an exponential dependence of source and leaves the atom with a constant kinetic energy. The escape probability on the depth of the parent atom. A compila kinetic energy is given by the differences in binding energies for tion of data from a variety of sources has been used to generate the three levels (for example, EK-E L, - EL ) minus a correction 2 an escape depth curve which falls in the range of 5-30 A in the term for the work function and electron wave function relaxation. energy range from 0 to 3000 eV. The observed escape depth does When the Auger transition occurs within a few angstroms of the not show a strong dependence on the matrix.
Author : Carol P. Lofton
Publisher :
Page : 67 pages
File Size : 11,15 MB
Release : 1978
Category : Electron spectroscopy
ISBN :
Author : Siegfried Hofmann
Publisher : Springer Science & Business Media
Page : 544 pages
File Size : 40,51 MB
Release : 2012-10-25
Category : Science
ISBN : 3642273807
To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.
Author : John F. Watts
Publisher : Oxford University Press, USA
Page : 100 pages
File Size : 21,8 MB
Release : 1990
Category : Science
ISBN :
Surface analysis--the examination of the outer few nanometers of a material--is a routine undertaking in laboratories throughout the world, and is of great importance in such areas as corrosion, adhesion, polymer surface treatment, and microelectronics fabrication. This handbook provides an introduction to the two most popular surface analysis techniques: X-ray photoelectron spectroscopy and Auger electron spectroscopy. It explains the underlying physical principles, discusses instrumentation, and looks at the interpretation of resulting spectra. Applications of the two techniques are considered, and a critical comparison with other available methods is also included. This fully illustrated guide will be a valuable introduction for students and researchers in physics, engineering, and materials science.
Author : M. P. Seah
Publisher :
Page : pages
File Size : 17,68 MB
Release : 1982
Category : Atoms
ISBN :
Author : British Standards Institute Staff
Publisher :
Page : 28 pages
File Size : 42,74 MB
Release : 1915-08-31
Category :
ISBN : 9780580795893
Surfaces, Chemical analysis and testing, Analysis, Depth, X-ray photoelectron spectroscopy, Photoelectron spectroscopy, Spectroscopy, Auger electron spectroscopy, Ions, Films (states of matter), Thin films, Calibration, Measurement
Author : Robert Baboian
Publisher : ASTM International
Page : 887 pages
File Size : 44,4 MB
Release : 2005
Category : Corrosion and anti-corrosives
ISBN :
Author : John C. Riviere
Publisher : CRC Press
Page : 671 pages
File Size : 48,43 MB
Release : 2009-06-24
Category : Science
ISBN : 1420007807
The original Handbook of Surface and Interface Analysis: Methods for Problem-Solving was based on the authors' firm belief that characterization and analysis of surfaces should be conducted in the context of problem solving and not be based on the capabilities of any individual technique. Now, a decade later, trends in science and technology appear
Author : Horst Czichos
Publisher : Springer Science & Business Media
Page : 1244 pages
File Size : 36,75 MB
Release : 2011-07-22
Category : Technology & Engineering
ISBN : 3642166415
This Springer Handbook of Metrology and Testing presents the principles of Metrology – the science of measurement – and the methods and techniques of Testing – determining the characteristics of a given product – as they apply to chemical and microstructural analysis, and to the measurement and testing of materials properties and performance, including modelling and simulation. The principal motivation for this Handbook stems from the increasing demands of technology for measurement results that can be used globally. Measurements within a local laboratory or manufacturing facility must be able to be reproduced accurately anywhere in the world. The book integrates knowledge from basic sciences and engineering disciplines, compiled by experts from internationally known metrology and testing institutions, and academe, as well as from industry, and conformity-assessment and accreditation bodies. The Commission of the European Union has expressed this as there is no science without measurements, no quality without testing, and no global markets without standards.