Concise Encyclopedia of Materials Characterization


Book Description

To use materials effectively, their composition, degree of perfection, physical and mechanical characteristics, and microstructure must be accurately determined. This concise encyclopledia covers the wide range of characterization techniques necessary to achieve this. Articles included are not only concerned with the characterization techniques of specific materials such as polymers, metals, ceramics and semiconductors but also techniques which can be applied to materials in general. The techniques described cover bulk methods, and also a number of specific methods to study the topography and composition of surface and near-surface regions. These techniques range from the well-established and traditional to the very latest including: atomic force microscopy; confocal optical microscopy; gamma ray diffractometry; thermal wave imaging; x-ray diffraction and time-resolved techniques. This unique concise encyclopedia comprises 116 articles by leading experts in the field from around the world to create the ideal guide for materials scientists, chemists and engineers involved with any aspect of materials characterization. With over 540 illustrations, extensive cross-referencing, approximately 900 references, and a detailed index, this concise encyclopedia will be a valuable asset to any materials science collection.




An Introduction to Surface Analysis by XPS and AES


Book Description

Provides a concise yet comprehensive introduction to XPS and AES techniques in surface analysis This accessible second edition of the bestselling book, An Introduction to Surface Analysis by XPS and AES, 2nd Edition explores the basic principles and applications of X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques. It starts with an examination of the basic concepts of electron spectroscopy and electron spectrometer design, followed by a qualitative and quantitative interpretation of the electron spectrum. Chapters examine recent innovations in instrument design and key applications in metallurgy, biomaterials, and electronics. Practical and concise, it includes compositional depth profiling; multi-technique analysis; and everything about samples—including their handling, preparation, stability, and more. Topics discussed in more depth include peak fitting, energy loss background analysis, multi-technique analysis, and multi-technique profiling. The book finishes with chapters on applications of electron spectroscopy in materials science and the comparison of XPS and AES with other analytical techniques. Extensively revised and updated with new material on NAPXPS, twin anode monochromators, gas cluster ion sources, valence band spectra, hydrogen detection, and quantification Explores key spectroscopic techniques in surface analysis Provides descriptions of latest instruments and techniques Includes a detailed glossary of key surface analysis terms Features an extensive bibliography of key references and additional reading Uses a non-theoretical style to appeal to industrial surface analysis sectors An Introduction to Surface Analysis by XPS and AES, 2nd Edition is an excellent introductory text for undergraduates, first-year postgraduates, and industrial users of XPS and AES.







Ion Spectroscopies for Surface Analysis


Book Description

Determining the elemental composition of surfaces is an essential measurement in characterizing solid surfaces. At present, many ap proaches may be applied for measuring the elemental and molecular composition of a surface. Each method has particular strengths and limitations that often are directly connected to the physical processes involved. Typically, atoms and molecules on the surface and in the near surface region may be excited by photons, electrons, ions, or neutrals, and the detected particles are emitted, ejected, or scattered ions or electrons. The purpose of this book is to bring together a discussion of the surface compositional analysis that depends on detecting scattered or sputtered ions, and the methods emphasized are those where instruments are commercially available for carrying out the analysis. For each topic treated, the physical principles, instrumentation, qualitative analysis, artifacts, quantitative analysis, applications, opportunities, and limita tions are discussed. The first chapter provides an overview of the role of elemental composition in surface science; compositional depth profiling; stimulation by an electric field, electrons, neutrals, or photons and detection of ions; and then stimulation by ions, and detection of ions, electrons, photons, or neutrals.




Springer Handbook of Metrology and Testing


Book Description

This Springer Handbook of Metrology and Testing presents the principles of Metrology – the science of measurement – and the methods and techniques of Testing – determining the characteristics of a given product – as they apply to chemical and microstructural analysis, and to the measurement and testing of materials properties and performance, including modelling and simulation. The principal motivation for this Handbook stems from the increasing demands of technology for measurement results that can be used globally. Measurements within a local laboratory or manufacturing facility must be able to be reproduced accurately anywhere in the world. The book integrates knowledge from basic sciences and engineering disciplines, compiled by experts from internationally known metrology and testing institutions, and academe, as well as from industry, and conformity-assessment and accreditation bodies. The Commission of the European Union has expressed this as there is no science without measurements, no quality without testing, and no global markets without standards.




Auger Electron Spectroscopy


Book Description

Auger electron spectroscopy is rapidly developing into the single most powerful analytical technique in basic and applied science.for investigating the chemical and structural properties of solids. Its ex plosive growth beginning in 1967 was triggered by the development of Auger analyzers capable of de tecting one atom layer of material in a fraction of a second. Continued growth was guaranteed firstly by the commercial availability of apparatus which combined the capabilities of scanning electron mi croscopy and ion-mill depth profiling with Auger analysis, and secondly by the increasing need to know the atomistics of many processes in fundamental research and engineering applications. The expanding use of Auger analysis was accompanied by an increase in the number of publications dealing with it. Because of the developing nature of Auger spectroscopy, the articles have appeared in many different sources covering diverse disciplines, so that it is extremely difficult to discover just what has or has not been subjected to Auger analysis. In this situation, a comprehensive bibliography is obviou-sly useful to those both inside and outside the field. For those in the field, this bibliography should be a wonderful time saver for locating certain references, in researching a particular topic, or when considering various aspects of instrumentation or data analysis. This bibliography not only provides the most complete listing of references pertinent to surface Auger analysis available today, but it is also a basis for extrapolating from past trends to future expectations.




Auger- and X-Ray Photoelectron Spectroscopy in Materials Science


Book Description

To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.







Proceedings of the 8th Pacific Rim International Conference on Advanced Materials and Processing (PRICM-8)


Book Description

PRICM-8 features the most prominent and largest-scale interactions in advanced materials and processing in the Pacific Rim region. The conference is unique in its intrinsic nature and architecture which crosses many traditional discipline and cultural boundaries. This is a comprehensive collection of papers from the 15 symposia presented at this event.




Adhesion and Adsorption of Polymers


Book Description

Honolulu is a most beautiful place, suitable for all occa sions. Its choice as the meeting site for the first Joint Chemical Congress between the American Chemical Society and the Chemical Society of Japan was praised by scientists from both sides. During this Congress, the International Conference on Adhesion and Adsorption of Polymers was held at the Hyatt Regency Hotel between April 2 and 5, 1979. We had speakers from ten nations presenting over forty papers related to the subject matter. It was a memorable event. Unlike our two previous adhesion symposia held in 1971 and 1975, this was the first time in the same conference that we discussed both adhesion and adsorption of polymers simultaneously. These two important phenomena are not only inter-related, but also equally important in adhesive technology as well as biochemical processes. The papers presented to this Conference deal with these two phenomena from both fundamental and practical viewpoints. Furthermore, with the advance of new surface analytical techniques, the actual, microscopic happenings at the interfaces can be pin pointed. Thus, characterization of interface became one of the major focuses of this Conference. As a result, a broad coverage of the subject matter includes statistical thermodynamics, surface physics, surface analysis, fracture mechanics, viscoelasticity, failure analysis, surface modification, adsorption kinetics, bio polymer adsorption, etc. Thanks to the diligence of our contri butors, we are now able to publish the final papers in these two volumes.