Thin Film Phenomena


Book Description







Thin Film Phenomena


Book Description




Nanoscale Phenomena in Ferroelectric Thin Films


Book Description

This book presents the recent advances in the field of nanoscale science and engineering of ferroelectric thin films. It comprises two main parts, i.e. electrical characterization in nanoscale ferroelectric capacitor, and nano domain manipulation and visualization in ferroelectric materials. Well known le'adingexperts both in relevant academia and industry over the world (U.S., Japan, Germany, Switzerland, Korea) were invited to contribute to each chapter. The first part under the title of electrical characterization in nanoscale ferroelectric capacitors starts with Chapter 1, "Testing and characterization of ferroelectric thin film capacitors," written by Dr. I. K. Yoo. The author provides a comprehensive review on basic concepts and terminologies of ferroelectric properties and their testing methods. This chapter also covers reliability issues in FeRAMs that are crucial for commercialization of high density memory products. In Chapter 2, "Size effects in ferroelectric film capacitors: role ofthe film thickness and capacitor size," Dr. I. Stolichnov discusses the size effects both in in-plane and out-of-plane dimensions of the ferroelectric thin film. The author successfully relates the electric performance and domain dynamics with proposed models of charge injection and stress induced phase transition. The author's findings present both a challenging problem and the clue to its solution of reliably predicting the switching properties for ultra-thin ferroelectric capacitors. In Chapter 3, "Ferroelectric thin films for memory applications: nanoscale characterization by scanning force microscopy," Prof. A.




Chemical Vapor Deposition


Book Description

In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.




Thin Film Processes


Book Description

The book Thin Film Processes - Artifacts on Surface Phenomena and Technological Facets presents topics on global advancements in theoretical and experimental facts, instrumentation and practical applications of thin-film material perspectives and its applications. The aspect of this book is associated with the thin-film physics, the methods of deposition, optimization parameters and its wide technological applications. This book is divided into three main sections: Thin Film Deposition Methods: A Synthesis Perspective; Optimization Parameters in the Thin Film Science and Application of Thin Films: A Synergistic Outlook. Collected chapters provide applicable knowledge for a wide range of readers: common men, students and researchers. It was constructed by experts in diverse fields of thin-film science and technology from over 15 research institutes across the globe.




Principles of Vapor Deposition of Thin Films


Book Description

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.* Offers detailed derivation of important formulae.* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.




Size Effects in Thin Films


Book Description

A complete and comprehensive study of transport phenomena in thin continuous metal films, this book reviews work carried out on external-surface and grain-boundary electron scattering and proposes new theoretical equations for transport properties of these films. It presents a complete theoretical view of the field, and considers imperfection and impurity effects.







Thin Liquid Films


Book Description

This book is a treatise on the thermodynamic and dynamic properties of thin liquid films at solid surfaces and, in particular, their rupture instabilities. For the quantitative study of these phenomena, polymer thin films (sometimes referred to as “ultrathin”) have proven to be an invaluable experimental model system. What is it that makes thin film instabilities special and interesting? First, thin polymeric films have an important range of applications. An understanding of their instabilities is therefore of practical relevance for the design of such films. The first chapter of the book intends to give a snapshot of current applications, and an outlook on promising future ones. Second, thin liquid films are an interdisciplinary research topic, which leads to a fairly heterogeneous community working on the topic. It justifies attempting to write a text which gives a coherent presentation of the field which researchers across their specialized communities might be interested in. Finally, thin liquid films are an interesting laboratory for a theorist to confront a well-established theory, hydrodynamics, with its limits. Thin films are therefore a field in which a highly fruitful exchange and collaboration exists between experimentalists and theorists. The book stretches from the more concrete to more abstract levels of study: we roughly progress from applications via theory and experiment to rigorous mathematical theory. For an experimental scientist, the book should serve as a reference and guide to what is the current consensus of the theoretical underpinnings of the field of thin film dynamics. Controversial problems on which such a consensus has not yet been reached are clearly indicated in the text, as well as discussed in a final chapter. From a theoretical point of view, the field of dewetting has mainly been treated in a mathematically ‘light’ yet elegant fashion, often making use of scaling arguments. For the untrained researcher, this approach is not always easy to follow. The present book attempts to bridge between the ‘light’ and the ‘rigorous’, always with the ambition to enhance insight and understanding - and to not let go the elegance of the theory.