X-Ray Standing Waves on Surfaces


Book Description

The x-ray standing wave technique is a sensitive tool for determining the position of atoms within a crystal, adsorbed onto a surface or distributed within the crystal or at the interface. The technique is based on the x-ray standing wave field that arises as a result of the interference of coherently related incident and reflected plane waves and is described by the theory of dynamical diffraction of x-rays. When two coherently related traveling plane waves having the same wavelength pass through each other their superposition results in a standing wave of period D = lambda/2 sin theta; where lambda is the wavelength of the traveling waves, and 2 theta is the relative angle between them. The generation of a standing wave requires both an incident and a reflected wave and the letter can be generated by either Bragg diffraction or total external reflection.




X-ray Standing Wave Technique, The: Principles And Applications


Book Description

The X-ray standing wave (XSW) technique is an X-ray interferometric method combining diffraction with a multitude of spectroscopic techniques. It is extremely powerful for obtaining information about virtually all properties of surfaces and interfaces on the atomic scale. However, as with any other technique, it has strengths and limitations. The proper use and necessary understanding of this method requires knowledge in quite different fields of physics and technology. This volume presents comprehensively the theoretical background, technical requirements and distinguished experimental highlights of the technique. Containing contributions from the most prominent experts of the technique, such as Andre Authier, Boris Batterman, Michael J Bedzyk, Jene Golovchenko, Victor Kohn, Michail Kovalchuk, Gerhard Materlik and D Phil Woodruff, the book equips scientists with all the necessary information and knowledge to understand and use the XSW technique in practically all applications.










X-ray Standing Wave Imaging of Metal Atoms on Semiconductor and Oxide Surfaces


Book Description

The 1/3 monolayer (ML) Sn/Si(III)-(√3 x √3)R30° surface structure has been extensively studied using x-ray standing waves (XSW). The summation of several XSW measured hkl Fourier components results in a three-dimensional, model-independent direct-space image of the Sn atomic distribution. While the image demonstrates that the Sn atoms are located at Si(111) T4-adsorption sites, it alone cannot determine whether the Sn atomic distribution is flat or asymmetric. However, conventional XSW analysis can make this distinction, concluding that one-third of the Sn atoms are located 0.26 A higher than the remaining two-thirds. This "one up and two down" distribution is consistent with the vertical displacements predicted by a dynamical fluctuations model. A second sample prepared in a slightly different manner exhibits the same long-range surface symmetry, but a direct space image clearly reveals that a significant fraction of the Sn atoms in the second surface have substituted for Si atoms in the bottom of the Si surface bilayer.










The X-ray Standing Wave Technique


Book Description

The X-ray standing wave (XSW) technique is an X-ray interferometric method combining diffraction with a multitude of spectroscopic techniques. It is extremely powerful for obtaining information about virtually all properties of surfaces and interfaces on the atomic scale. However, as with any other technique, it has strengths and limitations. The proper use and necessary understanding of this method requires knowledge in quite different fields of physics and technology. This volume presents comprehensively the theoretical background, technical requirements and distinguished experimental highlights of the technique. Containing contributions from the most prominent experts of the technique, such as Andre Authier, Boris Batterman, Michael J Bedzyk, Jene Golovchenko, Victor Kohn, Michail Kovalchuk, Gerhard Materlik and D Phil Woodruff, the book equips scientists with all the necessary information and knowledge to understand and use the XSW technique in practically all applications.




Fundamentals of Crystals


Book Description

From the reviews: "[...] an excellent reference book. I have no doubt it will become a much-thumbed resource for students and researchers in mineralogy and crystallography." Geological Magazine




Springer Handbook of Surface Science


Book Description

This handbook delivers an up-to-date, comprehensive and authoritative coverage of the broad field of surface science, encompassing a range of important materials such metals, semiconductors, insulators, ultrathin films and supported nanoobjects. Over 100 experts from all branches of experiment and theory review in 39 chapters all major aspects of solid-state surfaces, from basic principles to applications, including the latest, ground-breaking research results. Beginning with the fundamental background of kinetics and thermodynamics at surfaces, the handbook leads the reader through the basics of crystallographic structures and electronic properties, to the advanced topics at the forefront of current research. These include but are not limited to novel applications in nanoelectronics, nanomechanical devices, plasmonics, carbon films, catalysis, and biology. The handbook is an ideal reference guide and instructional aid for a wide range of physicists, chemists, materials scientists and engineers active throughout academic and industrial research.